Micaela Pozzati, Felix Boll, Matteo Crisci, Sara Domenici, Bernd Smarsly, Teresa Gatti, Mengjiao Wang
{"title":"关于表面活性剂辅助液相剥离水中的 MoS2 和 WS2 以实现可持续二维材料油墨的系统研究","authors":"Micaela Pozzati, Felix Boll, Matteo Crisci, Sara Domenici, Bernd Smarsly, Teresa Gatti, Mengjiao Wang","doi":"10.1002/pssr.202400039","DOIUrl":null,"url":null,"abstract":"MoS<sub>2</sub> and WS<sub>2</sub> have gathered significant attention due to their interesting and tunable properties and their wide range of applications. Liquid phase exfoliation (LPE) is a common and facile method to prepare 2D MoS<sub>2</sub> and WS<sub>2</sub>. Currently, the principally employed solvents for LPE of MoS<sub>2</sub> and WS<sub>2</sub> are expensive, toxic and have high boiling points. These drawbacks encourage to find more sustainable alternatives to the liquid medium used for the preparation of 2D material inks. Water would be the best option, but surfactants are necessary for LPE in water, since MoS<sub>2</sub> and WS<sub>2</sub> are hydrophobic. Organic molecules with amphoteric character such as sodium dodecyl sulfate (SDS), sodium dodecylbenzene sulfonate (SDBS) and sodium hexyl sulfonate (SHS) are selected as suitable candidates for the role of surfactant. However, the study of these surfactants used in LPE is barely systematically reported. In this work, we present a detailed investigation on the impact of these surfactants on the LPE of MoS<sub>2</sub> and WS<sub>2</sub>, which are representatives of TMDs. By characterizing and qualifying the products from average number of layers, we find that all the surfactants work efficiently to exfoliate MoS<sub>2</sub> and WS<sub>2</sub> into few layers, and SHS stabilizes the 2D layers better than the other two surfactants. However, in terms of yield and relative surfactant concentration, we don’t identify a real trade-off between maximized quantity of exfoliated materials and minimized surfactant concentration, which prompts to select the colloidal ink based on the specific further needs for processing.","PeriodicalId":54619,"journal":{"name":"Physica Status Solidi-Rapid Research Letters","volume":"1 1","pages":""},"PeriodicalIF":2.5000,"publicationDate":"2024-02-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Systematic investigation on the surfactant-assisted liquid phase exfoliation of MoS2 and WS2 in water for sustainable 2D material inks\",\"authors\":\"Micaela Pozzati, Felix Boll, Matteo Crisci, Sara Domenici, Bernd Smarsly, Teresa Gatti, Mengjiao Wang\",\"doi\":\"10.1002/pssr.202400039\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"MoS<sub>2</sub> and WS<sub>2</sub> have gathered significant attention due to their interesting and tunable properties and their wide range of applications. Liquid phase exfoliation (LPE) is a common and facile method to prepare 2D MoS<sub>2</sub> and WS<sub>2</sub>. Currently, the principally employed solvents for LPE of MoS<sub>2</sub> and WS<sub>2</sub> are expensive, toxic and have high boiling points. These drawbacks encourage to find more sustainable alternatives to the liquid medium used for the preparation of 2D material inks. Water would be the best option, but surfactants are necessary for LPE in water, since MoS<sub>2</sub> and WS<sub>2</sub> are hydrophobic. Organic molecules with amphoteric character such as sodium dodecyl sulfate (SDS), sodium dodecylbenzene sulfonate (SDBS) and sodium hexyl sulfonate (SHS) are selected as suitable candidates for the role of surfactant. However, the study of these surfactants used in LPE is barely systematically reported. In this work, we present a detailed investigation on the impact of these surfactants on the LPE of MoS<sub>2</sub> and WS<sub>2</sub>, which are representatives of TMDs. By characterizing and qualifying the products from average number of layers, we find that all the surfactants work efficiently to exfoliate MoS<sub>2</sub> and WS<sub>2</sub> into few layers, and SHS stabilizes the 2D layers better than the other two surfactants. 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Systematic investigation on the surfactant-assisted liquid phase exfoliation of MoS2 and WS2 in water for sustainable 2D material inks
MoS2 and WS2 have gathered significant attention due to their interesting and tunable properties and their wide range of applications. Liquid phase exfoliation (LPE) is a common and facile method to prepare 2D MoS2 and WS2. Currently, the principally employed solvents for LPE of MoS2 and WS2 are expensive, toxic and have high boiling points. These drawbacks encourage to find more sustainable alternatives to the liquid medium used for the preparation of 2D material inks. Water would be the best option, but surfactants are necessary for LPE in water, since MoS2 and WS2 are hydrophobic. Organic molecules with amphoteric character such as sodium dodecyl sulfate (SDS), sodium dodecylbenzene sulfonate (SDBS) and sodium hexyl sulfonate (SHS) are selected as suitable candidates for the role of surfactant. However, the study of these surfactants used in LPE is barely systematically reported. In this work, we present a detailed investigation on the impact of these surfactants on the LPE of MoS2 and WS2, which are representatives of TMDs. By characterizing and qualifying the products from average number of layers, we find that all the surfactants work efficiently to exfoliate MoS2 and WS2 into few layers, and SHS stabilizes the 2D layers better than the other two surfactants. However, in terms of yield and relative surfactant concentration, we don’t identify a real trade-off between maximized quantity of exfoliated materials and minimized surfactant concentration, which prompts to select the colloidal ink based on the specific further needs for processing.
期刊介绍:
Physica status solidi (RRL) - Rapid Research Letters was designed to offer extremely fast publication times and is currently one of the fastest double peer-reviewed publication media in solid state and materials physics. Average times are 11 days from submission to first editorial decision, and 12 days from acceptance to online publication. It communicates important findings with a high degree of novelty and need for express publication, as well as other results of immediate interest to the solid-state physics and materials science community. Published Letters require approval by at least two independent reviewers.
The journal covers topics such as preparation, structure and simulation of advanced materials, theoretical and experimental investigations of the atomistic and electronic structure, optical, magnetic, superconducting, ferroelectric and other properties of solids, nanostructures and low-dimensional systems as well as device applications. Rapid Research Letters particularly invites papers from interdisciplinary and emerging new areas of research.