Wanli Zhang, Feng Shi, Ci Song, Ningye Ruan, Guipeng Tie, Bo Wang, Guoyan Sun, Xing Peng
{"title":"用于大孔径激光光学元件的超精密光学加工技术:熔融石英光学器件的波纹结构去除和抗激光损伤能力增强","authors":"Wanli Zhang, Feng Shi, Ci Song, Ningye Ruan, Guipeng Tie, Bo Wang, Guoyan Sun, Xing Peng","doi":"10.1016/j.optlastec.2024.110685","DOIUrl":null,"url":null,"abstract":"In AMRF (arrayed magnetorheological finishing) process of fused silica laser optics, ripple structures would generate on the optical surface. The ripple structures could cause nonlinear self-focusing and localized energy deposition, finally induced laser damage. In this work, the removal of ripple structures and the improvement of anti-laser damage characteristics were studied. First, the heat deposition and light-field enhancement induced by ripple structures were analyzed by finite element simulation method, and the negative impact of ripple structures was clarified. Then, the ripple-structure surface was polished by a combined technique of low-stress CCOS (computer control optical surfacing) and ion beam finishing (IBF). After the combined polishing process, the ripple structures and the hydrolyzed layer on the surface were removed, the photo-thermal absorption decreased from 0.736 ppm to 0.124 ppm, and the laser induced damage threshold (LIDT) increased from 6.3 J/cm to 7.4 J/cm. In this work, the combined technique was able to remove the ripple structures while maintaining the processing efficiency, and it also could improve the anti-laser damage characteristics of the optics. The relative research results had important reference value for ultra-precision manufacturing of large-aperture laser optics.","PeriodicalId":19597,"journal":{"name":"Optics & Laser Technology","volume":"92 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-02-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Ultra-precision optical processing technology for large-aperture laser optics: Ripple structure removal and laser damage resistance enhancement of fused silica optics\",\"authors\":\"Wanli Zhang, Feng Shi, Ci Song, Ningye Ruan, Guipeng Tie, Bo Wang, Guoyan Sun, Xing Peng\",\"doi\":\"10.1016/j.optlastec.2024.110685\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In AMRF (arrayed magnetorheological finishing) process of fused silica laser optics, ripple structures would generate on the optical surface. The ripple structures could cause nonlinear self-focusing and localized energy deposition, finally induced laser damage. In this work, the removal of ripple structures and the improvement of anti-laser damage characteristics were studied. First, the heat deposition and light-field enhancement induced by ripple structures were analyzed by finite element simulation method, and the negative impact of ripple structures was clarified. Then, the ripple-structure surface was polished by a combined technique of low-stress CCOS (computer control optical surfacing) and ion beam finishing (IBF). After the combined polishing process, the ripple structures and the hydrolyzed layer on the surface were removed, the photo-thermal absorption decreased from 0.736 ppm to 0.124 ppm, and the laser induced damage threshold (LIDT) increased from 6.3 J/cm to 7.4 J/cm. In this work, the combined technique was able to remove the ripple structures while maintaining the processing efficiency, and it also could improve the anti-laser damage characteristics of the optics. The relative research results had important reference value for ultra-precision manufacturing of large-aperture laser optics.\",\"PeriodicalId\":19597,\"journal\":{\"name\":\"Optics & Laser Technology\",\"volume\":\"92 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-02-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optics & Laser Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1016/j.optlastec.2024.110685\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optics & Laser Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1016/j.optlastec.2024.110685","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Ultra-precision optical processing technology for large-aperture laser optics: Ripple structure removal and laser damage resistance enhancement of fused silica optics
In AMRF (arrayed magnetorheological finishing) process of fused silica laser optics, ripple structures would generate on the optical surface. The ripple structures could cause nonlinear self-focusing and localized energy deposition, finally induced laser damage. In this work, the removal of ripple structures and the improvement of anti-laser damage characteristics were studied. First, the heat deposition and light-field enhancement induced by ripple structures were analyzed by finite element simulation method, and the negative impact of ripple structures was clarified. Then, the ripple-structure surface was polished by a combined technique of low-stress CCOS (computer control optical surfacing) and ion beam finishing (IBF). After the combined polishing process, the ripple structures and the hydrolyzed layer on the surface were removed, the photo-thermal absorption decreased from 0.736 ppm to 0.124 ppm, and the laser induced damage threshold (LIDT) increased from 6.3 J/cm to 7.4 J/cm. In this work, the combined technique was able to remove the ripple structures while maintaining the processing efficiency, and it also could improve the anti-laser damage characteristics of the optics. The relative research results had important reference value for ultra-precision manufacturing of large-aperture laser optics.