Ghazi Aman Nowsherwan, Muhammad Ahmad, Rub Nawaz Bhuttee, Maryam Tahir, Muhammad Azhar, Sabah Haider, Nadia Anwar, Muhammad Bilal, Sabeen Ameen, Syed Sajjad Hussain, Saira Riaz, Shahzad Naseem
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The cubic crystal structure of the materials was confirmed through XRD spectroscopy, while FTIR results validated the existence of chemical bonds, signified by sharp peaks at 608 cm<jats:sup>−1</jats:sup> and 667 cm<jats:sup>−1</jats:sup> in the fingerprint region. SEM imaging revealed a granular-like agglomerated structure, with EDX confirming the elemental composition of the samples. The incorporation of Co, Fe, and Zr ions into ITO is aimed at improving photoconductivity and the optical bandgap, with the ultimate objective of enhancing performance in photovoltaic applications. Our findings showed a significant decrease in optical transmission in the visible spectrum. The bandgap also experienced a minor decrease from 3.67 eV to 3.53 eV. Analysis of the photoluminescence spectra exhibited the majority of emission peaks in the UV region, ascribed to electronic transitions occurring via band-to-band and band-to-impurity interactions within the ITO. Electrical measurements indicated lower resistance, higher current flow, and increased carrier concentration in transition metals–doped ITO compared to the undoped ITO, with Zr-doped ITO exhibiting the highest conductivity and optimal charge flow among all dopants. 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引用次数: 0
摘要
本研究介绍了通过射频磁控溅射法制造的原始和过渡金属(钴、铁和锆)掺杂氧化铟锡(ITO)薄膜的合成和表征。使用多种光谱和显微方法,如 XRD、傅立叶变换红外光谱、扫描电子显微镜、EDX、紫外可见光和聚光光谱以及四探针和 J-V 测量,全面研究了过渡金属掺杂对氧化铟锡薄膜特性的影响。XRD 光谱证实了材料的立方晶体结构,而 FTIR 结果则验证了化学键的存在,指纹区 608 cm-1 和 667 cm-1 处的尖锐峰表明了这一点。扫描电子显微镜成像显示了颗粒状的团聚结构,EDX 则证实了样品的元素组成。在 ITO 中加入 Co、Fe 和 Zr 离子旨在提高光导率和光带隙,最终目的是提高光伏应用的性能。我们的研究结果表明,可见光谱的光传输率明显下降。带隙也略有下降,从 3.67 eV 降至 3.53 eV。对光致发光光谱的分析表明,大部分发射峰位于紫外区,这是由于 ITO 内部通过带与带和带与杂质之间的相互作用发生了电子跃迁。电学测量表明,与未掺杂的 ITO 相比,掺杂过渡金属的 ITO 电阻更低、电流更大、载流子浓度更高,其中掺杂 Zr 的 ITO 在所有掺杂剂中具有最高的导电性和最佳的电荷流。这些在光学、结构和电学属性方面前景广阔的研究结果预示着这些材料在光伏系统应用方面的潜力。
Enhancing charge transport and photoluminescence characteristics via transition metals doping in ITO thin films
This study presents the synthesis and characterization of pristine and transition metal (Co, Fe, and Zr)-doped indium tin oxide (ITO) thin films fabricated via RF magnetron sputtering. The effect of transition metal doping on ITO thin films properties was comprehensively examined using numerous spectroscopic and microscopic methods such as XRD, FTIR, and SEM coupled with EDX, UV–visible and PL spectroscopy, and four-probe and J–V measurements. The cubic crystal structure of the materials was confirmed through XRD spectroscopy, while FTIR results validated the existence of chemical bonds, signified by sharp peaks at 608 cm−1 and 667 cm−1 in the fingerprint region. SEM imaging revealed a granular-like agglomerated structure, with EDX confirming the elemental composition of the samples. The incorporation of Co, Fe, and Zr ions into ITO is aimed at improving photoconductivity and the optical bandgap, with the ultimate objective of enhancing performance in photovoltaic applications. Our findings showed a significant decrease in optical transmission in the visible spectrum. The bandgap also experienced a minor decrease from 3.67 eV to 3.53 eV. Analysis of the photoluminescence spectra exhibited the majority of emission peaks in the UV region, ascribed to electronic transitions occurring via band-to-band and band-to-impurity interactions within the ITO. Electrical measurements indicated lower resistance, higher current flow, and increased carrier concentration in transition metals–doped ITO compared to the undoped ITO, with Zr-doped ITO exhibiting the highest conductivity and optimal charge flow among all dopants. These promising findings in terms of optical, structural, and electrical attributes signal the potential of these materials for photovoltaic system applications.