基于在空气中退火的纳米晶金刚石薄膜制备的金刚石纳米线的高性能场发射阴极

IF 2.4 4区工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Journal of Micromechanics and Microengineering Pub Date : 2024-01-16 DOI:10.1088/1361-6439/ad1efe

Yang Wang, Chen Lin, Jinwen Zhang

{"title":"基于在空气中退火的纳米晶金刚石薄膜制备的金刚石纳米线的高性能场发射阴极","authors":"Yang Wang, Chen Lin, Jinwen Zhang","doi":"10.1088/1361-6439/ad1efe","DOIUrl":null,"url":null,"abstract":"\n This paper reports the field emission (FE) characteristics of a diamond nanowires (DNWs) array. The nanocrystalline diamond (NCD) film was deposited on silicon by microwave plasma chemical vapor deposited (MPCVD) and then annealed in air forming DNWs and hydrogenated at last. A high-field flat-plate emission test structure with a 1.03 μm gap between anode and cathode was prepared and the electrical properties proved it feasible. The FE performance of DNWs array was measured in a vacuum test system and that of NCDs film either as a comparison. Finally, their FE parameters were analyzed and extracted based on the Fowler-Nordheim (F-N) theory. The results show that transforming NCDs film into DNWs array can improve the FE characteristics greatly. The turn-on field is as low as 1.36 V/μm dropping by one order of magnitude, while the field enhancement factor and FE current density are up to 156.68 and 484.75 mA/cm2 respectively rising both by two orders of magnitude. This excellent FE performance stems from the characteristics of large aspect ratio, very small tip radius and high density of DNWs.","PeriodicalId":16346,"journal":{"name":"Journal of Micromechanics and Microengineering","volume":null,"pages":null},"PeriodicalIF":2.4000,"publicationDate":"2024-01-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"High Performance Field Emission Cathode based on the Diamond Nanowires Prepared by Nanocrystalline Diamond Films Annealed in Air\",\"authors\":\"Yang Wang, Chen Lin, Jinwen Zhang\",\"doi\":\"10.1088/1361-6439/ad1efe\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\\n This paper reports the field emission (FE) characteristics of a diamond nanowires (DNWs) array. The nanocrystalline diamond (NCD) film was deposited on silicon by microwave plasma chemical vapor deposited (MPCVD) and then annealed in air forming DNWs and hydrogenated at last. A high-field flat-plate emission test structure with a 1.03 μm gap between anode and cathode was prepared and the electrical properties proved it feasible. The FE performance of DNWs array was measured in a vacuum test system and that of NCDs film either as a comparison. Finally, their FE parameters were analyzed and extracted based on the Fowler-Nordheim (F-N) theory. The results show that transforming NCDs film into DNWs array can improve the FE characteristics greatly. The turn-on field is as low as 1.36 V/μm dropping by one order of magnitude, while the field enhancement factor and FE current density are up to 156.68 and 484.75 mA/cm2 respectively rising both by two orders of magnitude. This excellent FE performance stems from the characteristics of large aspect ratio, very small tip radius and high density of DNWs.\",\"PeriodicalId\":16346,\"journal\":{\"name\":\"Journal of Micromechanics and Microengineering\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":2.4000,\"publicationDate\":\"2024-01-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Micromechanics and Microengineering\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://doi.org/10.1088/1361-6439/ad1efe\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Micromechanics and Microengineering","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1088/1361-6439/ad1efe","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}

引用次数: 0

摘要

本文报告了金刚石纳米线（DNWs）阵列的场发射（FE）特性。通过微波等离子体化学气相沉积（MPCVD）在硅上沉积纳米晶金刚石（NCD）薄膜，然后在空气中退火形成 DNWs，最后进行氢化。制备了阳极和阴极间隙为 1.03 μm 的高场平板发射测试结构，其电气性能证明该结构是可行的。在真空测试系统中测量了 DNW 阵列的 FE 性能，并与 NCD 薄膜的 FE 性能进行了比较。最后，根据 Fowler-Nordheim (F-N) 理论分析并提取了它们的 FE 参数。结果表明，将 NCDs 薄膜转化为 DNWs 阵列可以大大改善 FE 特性。开启磁场低至 1.36 V/μm，下降了一个数量级，而磁场增强因子和 FE 电流密度分别高达 156.68 和 484.75 mA/cm2，均上升了两个数量级。这种出色的 FE 性能源于大长径比、极小尖端半径和高密度 DNW 的特性。

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High Performance Field Emission Cathode based on the Diamond Nanowires Prepared by Nanocrystalline Diamond Films Annealed in Air

This paper reports the field emission (FE) characteristics of a diamond nanowires (DNWs) array. The nanocrystalline diamond (NCD) film was deposited on silicon by microwave plasma chemical vapor deposited (MPCVD) and then annealed in air forming DNWs and hydrogenated at last. A high-field flat-plate emission test structure with a 1.03 μm gap between anode and cathode was prepared and the electrical properties proved it feasible. The FE performance of DNWs array was measured in a vacuum test system and that of NCDs film either as a comparison. Finally, their FE parameters were analyzed and extracted based on the Fowler-Nordheim (F-N) theory. The results show that transforming NCDs film into DNWs array can improve the FE characteristics greatly. The turn-on field is as low as 1.36 V/μm dropping by one order of magnitude, while the field enhancement factor and FE current density are up to 156.68 and 484.75 mA/cm2 respectively rising both by two orders of magnitude. This excellent FE performance stems from the characteristics of large aspect ratio, very small tip radius and high density of DNWs.

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来源期刊

Journal of Micromechanics and Microengineering 工程技术-材料科学：综合

CiteScore

4.50

自引率

4.30%

发文量

136

审稿时长

2.8 months

期刊介绍： Journal of Micromechanics and Microengineering (JMM) primarily covers experimental work, however relevant modelling papers are considered where supported by experimental data. The journal is focussed on all aspects of: -nano- and micro- mechanical systems -nano- and micro- electomechanical systems -nano- and micro- electrical and mechatronic systems -nano- and micro- engineering -nano- and micro- scale science Please note that we do not publish materials papers with no obvious application or link to nano- or micro-engineering. Below are some examples of the topics that are included within the scope of the journal: -MEMS and NEMS: Including sensors, optical MEMS/NEMS, RF MEMS/NEMS, etc. -Fabrication techniques and manufacturing: Including micromachining, etching, lithography, deposition, patterning, self-assembly, 3d printing, inkjet printing. -Packaging and Integration technologies. -Materials, testing, and reliability. -Micro- and nano-fluidics: Including optofluidics, acoustofluidics, droplets, microreactors, organ-on-a-chip. -Lab-on-a-chip and micro- and nano-total analysis systems. -Biomedical systems and devices: Including bio MEMS, biosensors, assays, organ-on-a-chip, drug delivery, cells, biointerfaces. -Energy and power: Including power MEMS/NEMS, energy harvesters, actuators, microbatteries. -Electronics: Including flexible electronics, wearable electronics, interface electronics. -Optical systems. -Robotics.