高优先取向蒙脱石薄膜的制备和机械特性分析

Yucheng Li, Yonggui Chen, Li Liu, Guoping Zhang, Wei-min Ye, Qiong Wang
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引用次数: 0

摘要

本文介绍了一种用于制备高优先取向蒙脱石薄膜的实验方案,然后用纳米压痕法探测其内在机械特性(如杨氏模量和硬度)。这种高度平行取向的粘土薄膜是通过在去离子水中分散不同量的蒙脱石粉末(如 1 至 4 克),然后在硅晶片上干燥制备而成的。结果表明,薄膜具有层状结构,沿基底(00l)平面有明显的优先取向。不同试样的杨氏模量和硬度与深度有关。具体来说,在压痕深度为 100 nm 时,杨氏模量和硬度分别为 4.33 和 0.19 GPa,相当于由 ~80 层蒙脱石小板组成的蒙脱石触变体。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fabrication and mechanical characterization of highly preferentially oriented montmorillonite thin films
This paper presents an experimental protocol developed to prepare highly preferentially oriented montmorillonite thin films, and then to probe with nanoindentation their intrinsic mechanical properties (e.g., Young's modulus and hardness). Such highly parallel oriented clay thin films were prepared by dispersing varying amounts of montmorillonite powder (e.g., 1 to 4 g) in deionized water, followed by drying onto silicon wafers. Results indicate that the thin films possess a laminated fabric with a prominent preferred orientation along the basal (00l) plane. Depth-dependent Young’s modulus and hardness were also observed consistently across different specimens. Specifically, Young's modulus and hardness of 4.33 and 0.19 GPa respectively are found at the indentation depth of 100 nm, equivalent to montmorillonite tactoids consisting of ~80 layers of montmorillonite platelets, respectively.
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