植入式氮化镓中富镁缺陷的溶解和 p 型掺杂剂活化的增加

IF 2.7 3区 物理与天体物理 Q2 PHYSICS, APPLIED
K. Huynh, Y. Wang, M. E. Liao, J. Tweedie, P. Reddy, M. H. Breckenridge, R. Collazo, Z. Sitar, K. Sierakowski, M. Bockowski, X. Huang, M. Wojcik, M. S. Goorsky
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引用次数: 0

摘要

在高于 1400 °C 的温度下退火镁植入同位层氮化镓可消除反转域的形成,从而提高掺杂活化效率。在高达 1300 ℃ 的温度(一 GPa N2 超压)下进行植入后退火后,反转畴形式的扩展缺陷含有电性不活泼的镁,导致掺杂活化效率较低。三轴 X 射线数据显示,在 1300 ℃ 退火 10 分钟后,植入诱导的应变完全释放,这表明植入过程中形成的应变诱导点缺陷已经重组并形成了反转畴。然而,在 1400-1500 °C 的温度下退火(1 GPa 的 N2 过压),反转畴就不复存在了。虽然在 1400 ℃ 及以上退火后仍存在残余缺陷(如位错环),但对多个位错环进行的化学分析显示没有镁偏析的迹象。同时,退火温度越高、时间越长,差排环密度总体上呈下降趋势。此外,一旦形成反转畴并将样品冷却至室温,它们就会在 1400 °C 以上的退火过程中溶解。虽然以前也观察到过这种缺陷,但重要的发现是,这种缺陷可以在短时间、较高温度下溶解。早先的工作[Breckenridge 等人,J. Appl. Phys. Lett. 118, 022101 (2021)]对这些类型的样品进行了电学测量,结果表明 1400 ℃ 退火导致的掺杂活化效率比 1300 ℃ 观察到的效率高一个数量级。这项工作通过确定含有镁的反转域对先前的工作进行了补充,并指出,即使含镁反转域是在较低温度退火过程中形成的,使用较高温度(>1400 °C)退火循环来激活氮化镓中的镁,在缺陷密度和 p 型掺杂剂活化方面也有好处。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Dissolution of Mg-enriched defects in implanted GaN and increased p-type dopant activation
Annealing Mg-implanted homoepitaxial GaN at temperatures above 1400 °C eliminates the formation of inversion domains and leads to improved dopant activation efficiency. Extended defects, in the form of inversion domains, contain electrically inactive Mg after post-implantation annealing at temperatures as high as 1300 °C (one GPa N2 overpressure), which results in a low dopant activation efficiency. Triple-axis x-ray data reveal that implant-induced strain is fully relieved after annealing at 1300 °C for 10 min, indicating that strain-inducing point defects formed during implantation have reconfigured and inversion domains are formed. However, annealing at temperatures of 1400–1500 °C (one GPa N2 overpressure) eliminates the presence of the inversion domains. While residual defects, such as dislocation loops, still exist after annealing at and above 1400 °C, chemical analysis at multiple dislocation loops shows no sign of Mg segregation. Meanwhile, an overall decreasing trend in the dislocation loop density is observed after annealing at the higher temperatures and longer times. Additionally, once inversion domains are formed and the samples are cooled to room temperature, they are shown to dissolve with subsequent annealing above 1400 °C. While such defects have been observed before, the important finding that such defects can be dissolved with a short, higher temperature step is key. Earlier work [Breckenridge et al., J. Appl. Phys. Lett. 118, 022101 (2021)] addressing electrical measurements of these types of samples showed that annealing at 1400 °C leads to a dopant activation efficiency that is an order of magnitude higher than that observed at 1300 °C. This work complements earlier work by identifying the inversion domains, which incorporate Mg, and points to the benefits, in terms of defect density and p-type dopant activation, of using higher temperature (>1400 °C) annealing cycles to activate Mg in GaN, even if the Mg-containing inversion domains had been formed during lower temperature annealing.
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来源期刊
Journal of Applied Physics
Journal of Applied Physics 物理-物理:应用
CiteScore
5.40
自引率
9.40%
发文量
1534
审稿时长
2.3 months
期刊介绍: The Journal of Applied Physics (JAP) is an influential international journal publishing significant new experimental and theoretical results of applied physics research. Topics covered in JAP are diverse and reflect the most current applied physics research, including: Dielectrics, ferroelectrics, and multiferroics- Electrical discharges, plasmas, and plasma-surface interactions- Emerging, interdisciplinary, and other fields of applied physics- Magnetism, spintronics, and superconductivity- Organic-Inorganic systems, including organic electronics- Photonics, plasmonics, photovoltaics, lasers, optical materials, and phenomena- Physics of devices and sensors- Physics of materials, including electrical, thermal, mechanical and other properties- Physics of matter under extreme conditions- Physics of nanoscale and low-dimensional systems, including atomic and quantum phenomena- Physics of semiconductors- Soft matter, fluids, and biophysics- Thin films, interfaces, and surfaces
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