探索石墨烯与基底的相互作用:锡叠层外延石墨烯中的等离子激发

IF 4.5 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Zamin Mamiyev, C. Tegenkamp
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引用次数: 0

摘要

石墨烯等离子体,包括插层石墨烯中的等离子体,是一个重要的研究焦点,有望实现光操纵,并为从根本上了解多体电子相互作用提供了一个独特的平台。在本研究中,我们讨论了在 4H-SiC(0001) 缓冲层下插层锡形成的外延准无单层石墨烯中的低能质子激发结果。对片状等离子体色散的定量分析显示,锡诱导的(1\times1$)界面是金属性的,并导致形成电荷中性的石墨烯。发现了二维等离子体的红移,但只有在掺入钾之后才会出现。锡稀释界面显示了($\sqrt{3}\times\sqrt{3}$)重构,并导致了本质上的 n 型掺杂石墨烯,其表现与外延单层石墨烯的缓冲层类似。此外,石墨烯中纵向电荷密度波动与界面层的双极耦合似乎引发了质子多极分量的形成和损耗能量,因此它适合研究电子弱耦合二维异质系统中激发的邻近效应。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Exploring graphene-substrate interactions: Plasmonic excitation in Sn-intercalated epitaxial graphene
Graphene plasmons, including those in intercalated graphene, are an important research focus, with the promise of enabling light manipulation and providing a unique platform for gaining fundamental insights into many-body electronic interactions. In the present work, we discuss the results of low-energy plasmonic excitations in epitaxial quasi-free monolayer graphene formed by intercalation of Sn beneath the buffer layer on 4H-SiC(0001). The quantitative analysis of the sheet plasmon dispersion revealed that the Sn-induced ($1\times1$) interface is metallic and results in formation of charge-neutral graphene. A redshift of the 2D plasmon was found, but only after doping with potassium. The Sn-diluted interface, revealing a ($\sqrt{3}\times\sqrt{3}$) reconstruction and resulting in intrinsically n-type doped graphene, behaves comparably to the buffer layer for epitaxial monolayer graphene. Furthermore, it seems that a dipolar coupling of the longitudinal charge density fluctuations in graphene to the interface layer triggers the formation and the loss energy of a plasmonic multipole component, which therefore makes it suitable for studying proximity effects of excitations in electronically weakly coupled 2D heterosystems.
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来源期刊
2D Materials
2D Materials MATERIALS SCIENCE, MULTIDISCIPLINARY-
CiteScore
10.70
自引率
5.50%
发文量
138
审稿时长
1.5 months
期刊介绍: 2D Materials is a multidisciplinary, electronic-only journal devoted to publishing fundamental and applied research of the highest quality and impact covering all aspects of graphene and related two-dimensional materials.
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