掺杂铍的块状氮化镓中黄色发光带的起源

Solids Pub Date : 2024-01-04 DOI:10.3390/solids5010003
M. Reshchikov, Michał Boćkowski
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引用次数: 0

摘要

研究了通过高氮压溶液法生长的掺铍块状氮化镓晶体的光致发光(PL),并将其与通过分子束外延和金属有机化学气相沉积技术在蓝宝石上生长的氮化镓:铍层的光致发光进行了比较。后者的黄色发光带是由孤立的 BeGa 受体(YLBe 带)引起的,而块状 GaN:Be 晶体中的宽黄色带是 YLBe 带和另一个带(很可能是与 CN 有关的 YL1 带)的叠加。将块状 GaN:Be 晶体中的黄带归因于 BeGaON 复合物(一种深度供体)的观点受到了质疑。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The Origin of the Yellow Luminescence Band in Be-Doped Bulk GaN
Photoluminescence (PL) from Be-doped bulk GaN crystals grown by the High Nitrogen Pressure Solution method was studied and compared with PL from GaN:Be layers on sapphire grown by molecular beam epitaxy and metalorganic chemical vapor deposition techniques. The yellow luminescence band in the latter is caused by the isolated BeGa acceptor (the YLBe band), while the broad yellow band in bulk GaN:Be crystals is a superposition of the YLBe band and another band, most likely the CN-related YL1 band. The attribution of the yellow band in bulk GaN:Be crystals to the BeGaON complex (a deep donor) is questioned.
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CiteScore
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