B. Orfao, M. Abou Daher, R. A. Peña, B. G. Vasallo, S. Pérez, I. Íñiguez-de-la-Torre, G. Paz-Martínez, J. Mateos, Y. Roelens, M. Zaknoune, T. González
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引用次数: 0
摘要
本文分析了在 GaN 肖特基势垒二极管中观察到的导致低温下 I-V 曲线滞后行为的反向电流机制。通过从 33 到 475 K 的直流测量,我们将实验结果与使用统一模型预测二极管理想反向电流得到的结果进行比较,证明存在两种泄漏机制。在温度高于 200 K 时,普尔-弗伦克尔发射是主要机制,而在较低温度时,阱辅助隧穿则占主导地位。相应陷阱的能量也已确定,分别约为 0.2 和 0.45 eV。滞后现象归因于偏压引起的漏电流过程能态占据,这导致在二极管上施加高负压后反向电流减小。
Reverse-bias current hysteresis at low temperature in GaN Schottky barrier diodes
In this paper, we report an analysis of reverse current mechanisms observed in GaN Schottky barrier diodes leading to hysteretic behavior of the I–V curves at low temperature. By means of DC measurements from 33 to 475 K, we demonstrate the presence of two leakage mechanisms when comparing the experiments with the results obtained using a unified model to predict the ideal reverse current of the diode. Poole–Frenkel emission is the dominant mechanism for temperatures above 200 K, while trap-assisted tunneling prevails for lower temperatures, where also, hysteresis cycles are revealed by means of DC dual-sweep voltage measurements. The energy of the corresponding traps has also been determined, being around 0.2 and 0.45 eV, respectively. The hysteresis phenomenon is attributed to the bias-induced occupancy of the energy states originating the leakage-current processes, which leads to the reduction of the reverse current after a high negative voltage is applied to the diode.
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