{"title":"氧化锌薄膜的磁控溅射和沉积设备研究","authors":"Bo Zhang","doi":"10.56028/aetr.8.1.470.2023","DOIUrl":null,"url":null,"abstract":"The parts of magnetron sputtering system were given in the paper. Meanwhile, we analyzed the working theory of magnetron sputtering. After pure zinc oxide (ZnO) film was grown, N-doped films was Prepared in NH3-O2-Ar atmosphere using zinc as a target, and Al-doped and N+Al codoped ZnO films were grown by co-sputtering technique using zinc and aluminum as targets. AFM showed the crystal quality of the Films. The results of experiment demonstrate that high-quality films have been achieved by this technique, and research on ZnO films can be done by the equipment.","PeriodicalId":502380,"journal":{"name":"Advances in Engineering Technology Research","volume":"31 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2023-10-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Research on Equipment of Magnetron Sputtering and Deposition of ZnO Films\",\"authors\":\"Bo Zhang\",\"doi\":\"10.56028/aetr.8.1.470.2023\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The parts of magnetron sputtering system were given in the paper. Meanwhile, we analyzed the working theory of magnetron sputtering. After pure zinc oxide (ZnO) film was grown, N-doped films was Prepared in NH3-O2-Ar atmosphere using zinc as a target, and Al-doped and N+Al codoped ZnO films were grown by co-sputtering technique using zinc and aluminum as targets. AFM showed the crystal quality of the Films. The results of experiment demonstrate that high-quality films have been achieved by this technique, and research on ZnO films can be done by the equipment.\",\"PeriodicalId\":502380,\"journal\":{\"name\":\"Advances in Engineering Technology Research\",\"volume\":\"31 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-10-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Advances in Engineering Technology Research\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.56028/aetr.8.1.470.2023\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advances in Engineering Technology Research","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.56028/aetr.8.1.470.2023","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
摘要
文中给出了磁控溅射系统的各个部分。同时，我们分析了磁控溅射的工作原理。在生长出纯氧化锌（ZnO）薄膜后，以锌为靶，在 NH3-O2-Ar 气氛中制备了掺杂 N 的薄膜，并以锌和铝为靶，通过共溅射技术生长出掺杂 Al 和 N+Al 的共掺杂 ZnO 薄膜。原子力显微镜显示了薄膜的晶体质量。实验结果表明，利用该技术可以获得高质量的薄膜，并可利用该设备进行氧化锌薄膜的研究。
Research on Equipment of Magnetron Sputtering and Deposition of ZnO Films
The parts of magnetron sputtering system were given in the paper. Meanwhile, we analyzed the working theory of magnetron sputtering. After pure zinc oxide (ZnO) film was grown, N-doped films was Prepared in NH3-O2-Ar atmosphere using zinc as a target, and Al-doped and N+Al codoped ZnO films were grown by co-sputtering technique using zinc and aluminum as targets. AFM showed the crystal quality of the Films. The results of experiment demonstrate that high-quality films have been achieved by this technique, and research on ZnO films can be done by the equipment.
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