利用 DC-CPM 技术表征半绝缘砷化镓:铬

T. Tibermacine, A. Merazga
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引用次数: 0

摘要

本文采用恒定光电流法(CPM)从半绝缘掺杂铬的砷化镓的光吸收光谱中确定缺陷分布。通过使用导数法,我们从测量的光吸收光谱中提取了接近价带边缘 Ev 的态密度 DOS 分布。我们还开发了一个计算机代码程序 dc-CPM,利用从两种互补技术(恒定光电流法 "CPM "和瞬态光电流 "TPC")推断出的态密度模型计算总吸收光谱及其成分。研究发现,通过结合 "CPM "和 "TPC "这两种测量技术以及两种吸收光谱成分和,我们能够全面重建此类材料费米级以下和费米级以上的状态密度分布。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Characterization of semi-insulating GaAs:Cr by means of DC-CPM technique
In the present paper, constant photocurrent method, ‘CPM’ is used to determine the defects distribution from the optical absorption spectra of semi-insulating Cr-doped GaAs. By using the derivative method, we have extracted the distribution of the density of states DOS close to valence band edge Ev from the measured optical absorption spectrum. We have also developed a computer code program dc-CPM which have been used to compute the total absorption spectrum and their components using a model density of states inferred from two complementary techniques: constant photocurrent method, ‘CPM’ and transient photocurrent ‘TPC’. It is found that by combination of the two measurement techniques ‘CPM’ and ‘TPC’, and the two absorption spectra components and , we are able to have a full reconstruction of the density of states distribution below and above the Fermi level for such materials.
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