{"title":"未掺杂氢化非晶硅(a-Si:H)中光载流子的传输和重组建模","authors":"S. Tobbeche, A. Merazga","doi":"10.54966/jreen.v10i1.799","DOIUrl":null,"url":null,"abstract":"In this paper, we report on the simulation of steady state photoconductivity in un-doped a- Si:H at temperatures from 30 to 500 K. The model is based on recombination at dangling bond states and band tail states. It takes also into account the hopping transitions in the conduction hand tail states to describe the conduction in localized states at low temperatures. At high temperatures, the multiple trapping process is considered to describe the conduction in extended states. The density of states includes the exponential density of conduction band tail states and valence band tail slates and the density of dangling bond states. This later is determined by the Defect Pool Model ‘DPM’. The experimental features observed on the temperature dependence of the photoconductivity are generally the thermal quenching, the low activated region and the temperature independent photoconductivity at very low temperatures. All these observations are well reproduced by the model in un-doped a-Si:H. By the examination of the relative contributions of two processes of conduction: (i) the multiple trapping and (ii) the multiple trapping associated with the hopping, the model results show that the multiple trapping process of electrons where the conduction is assured by free carriers in the thermal quenching region above 140 K is important while the hopping process of electrons is negligible. At 140 K and below, the hopping transport of electrons in the conduction band tail states makes an important contribution in the photoconductivity. It explains successfully the low activated region and the temperature independent photoconductivity at very low temperatures.","PeriodicalId":314878,"journal":{"name":"Journal of Renewable Energies","volume":"1 4","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2023-11-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Modelling of transport and recombination of photocarriers in un-doped hydrogenated amorphous silicon (a-Si:H)\",\"authors\":\"S. Tobbeche, A. Merazga\",\"doi\":\"10.54966/jreen.v10i1.799\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, we report on the simulation of steady state photoconductivity in un-doped a- Si:H at temperatures from 30 to 500 K. The model is based on recombination at dangling bond states and band tail states. It takes also into account the hopping transitions in the conduction hand tail states to describe the conduction in localized states at low temperatures. At high temperatures, the multiple trapping process is considered to describe the conduction in extended states. The density of states includes the exponential density of conduction band tail states and valence band tail slates and the density of dangling bond states. This later is determined by the Defect Pool Model ‘DPM’. The experimental features observed on the temperature dependence of the photoconductivity are generally the thermal quenching, the low activated region and the temperature independent photoconductivity at very low temperatures. All these observations are well reproduced by the model in un-doped a-Si:H. By the examination of the relative contributions of two processes of conduction: (i) the multiple trapping and (ii) the multiple trapping associated with the hopping, the model results show that the multiple trapping process of electrons where the conduction is assured by free carriers in the thermal quenching region above 140 K is important while the hopping process of electrons is negligible. At 140 K and below, the hopping transport of electrons in the conduction band tail states makes an important contribution in the photoconductivity. 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引用次数: 0
摘要
本文报告了在 30 至 500 K 温度范围内模拟未掺杂 a- Si:H 的稳态光电导现象。该模型还考虑了传导手尾态的跳变,以描述低温下局部态的传导情况。在高温下,考虑了多重捕获过程,以描述扩展态的传导。态密度包括导带尾态和价带尾板的指数密度以及悬键态的密度。后者由缺陷池模型 "DPM "确定。在光电导率的温度依赖性方面观察到的实验特征通常是热淬灭、低激活区以及在极低温度下与温度无关的光电导率。在未掺杂的 a-Si:H 模型中,所有这些观察结果都得到了很好的再现。通过研究两个传导过程:(i) 多重捕获和 (ii) 与跳变相关的多重捕获的相对贡献,模型结果表明,在 140 K 以上的热淬火区,电子的多重捕获过程(由自由载流子保证传导)非常重要,而电子的跳变过程则可以忽略不计。在 140 K 及以下,电子在导带尾态的跳跃传输对光导率有重要贡献。它成功地解释了低活化区和在极低温度下与温度无关的光导率。
Modelling of transport and recombination of photocarriers in un-doped hydrogenated amorphous silicon (a-Si:H)
In this paper, we report on the simulation of steady state photoconductivity in un-doped a- Si:H at temperatures from 30 to 500 K. The model is based on recombination at dangling bond states and band tail states. It takes also into account the hopping transitions in the conduction hand tail states to describe the conduction in localized states at low temperatures. At high temperatures, the multiple trapping process is considered to describe the conduction in extended states. The density of states includes the exponential density of conduction band tail states and valence band tail slates and the density of dangling bond states. This later is determined by the Defect Pool Model ‘DPM’. The experimental features observed on the temperature dependence of the photoconductivity are generally the thermal quenching, the low activated region and the temperature independent photoconductivity at very low temperatures. All these observations are well reproduced by the model in un-doped a-Si:H. By the examination of the relative contributions of two processes of conduction: (i) the multiple trapping and (ii) the multiple trapping associated with the hopping, the model results show that the multiple trapping process of electrons where the conduction is assured by free carriers in the thermal quenching region above 140 K is important while the hopping process of electrons is negligible. At 140 K and below, the hopping transport of electrons in the conduction band tail states makes an important contribution in the photoconductivity. It explains successfully the low activated region and the temperature independent photoconductivity at very low temperatures.