超声波辐照结合氧化过程降解水溶液中的甲基膦酸二异丙酯

IF 0.5 Q4 CHEMISTRY, MULTIDISCIPLINARY
Muslim Hasan Allawi, Riyadh Almukhtar, S. Al-Humairi, A. D. Salman, Tatjana Juzsakova, Vitkor Sebestyén, Igor Cretescu
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引用次数: 0

摘要

按照一阶动力学模型,使用固定频率为 26.2 kHz 的超声波辐照对水溶液中甲基膦酸二异丙酯(DIMP)的降解进行了研究。研究的主要目的是确定以下实验参数的影响:pH 值(2、7 和 10 的不同值)、DIMP 初始浓度(7、14、30、50、80 毫克/升的不同浓度)、处理时间(15、30、45、60、80、90 分钟的不同时间段)和添加剂 CCl4 的浓度(0.002、0.004、0.006、0.008 毫克/升的不同浓度)。在 pH 值为 10、CCl4 浓度为 0.008 mg/L 的条件下,超声辐照 45 分钟后,水溶液中 DIMP 的去除率为 98%,这说明上述实验参数对 DIMP 降解过程有影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Degradation of diisopropyl methylphosphonate in aqueous solutions by ultrasonic irradiation combined with oxidation process
The degradation of diisopropyl methylphosphonate (DIMP) in aqueous solutions was studied using ultrasound irradiation with a fixed frequency of 26.2 kHz, following the first-order kinetic model. The study's primary goal was to determine the influence of the following experimental parameters: the pH (at different values of 2, 7 and 10), the initial concentration of DIMP (at different concentrations: 7, 14, 30, 50, 80 mg/L), the processing time (at different periods: 15, 30, 45, 60, 80, 90 min), and the concentration of the additive CCl4 (at different concentrations: 0.002, 0.004, 0.006, 0.008 mg/L). A DIMP removal efficiency of 98% from aqueous solution was obtained at pH 10 and 0.008 mg/L CCl4, after an ultrasound irradiation time of 45 min, pointing out the influence of the above-mentioned experimental parameters on the DIMP degradation process.
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来源期刊
Chemistry Journal of Moldova
Chemistry Journal of Moldova CHEMISTRY, MULTIDISCIPLINARY-
CiteScore
0.90
自引率
20.00%
发文量
8
审稿时长
12 weeks
期刊介绍: "Chemistry Journal of Moldova. General, Industrial and Ecological Chemistry" seeks to publish experimental or theoretical research results of outstanding significance and timeliness in all fields of Chemistry, including Industrial and Ecological Chemistry. The main goal of this edition is strengthening the Chemical Society of Moldova, following development of research in Moldovan chemical institutions and promotion of their collaboration with international chemical community. Manuscripts are welcome from all countries.
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