基于等弧长采样的高陡度非球面抛光轨迹规划

Xuefei Zhao, Shanshan Wang, Nansheng Zhang, Qun Hao, Feng Shi
{"title":"基于等弧长采样的高陡度非球面抛光轨迹规划","authors":"Xuefei Zhao, Shanshan Wang, Nansheng Zhang, Qun Hao, Feng Shi","doi":"10.1117/12.3000163","DOIUrl":null,"url":null,"abstract":"As a kind of common aspheric element, high-gradient aspheric surface is more and more used in high-tech fields because of its advantages of improving system accuracy and optimizing system comprehensive performance. At the same time, it also has higher requirements for its surface processing quality. The trajectory planning in polishing is an important part that affects the surface quality of the component. Due to the continuous change of the curvature radius of the high-steep aspheric surface and the large change rate of the vector height, the commonly used planar equidistant grating scanning trajectory is projected onto its surface. The distribution of trajectory points on the surface is obviously uneven, resulting in over polishing or under polishing in some areas. In order to ensure the machining accuracy of high-gradient aspheric surface, the concept of “common equal arc length point” is proposed and the equal arc length trajectory point planning model is established to make the spatial distance of any adjacent trajectory points on the aspheric surface consistent, and the spatial interval change rate is introduced to quantitatively analyze the distribution of trajectory points. Several aspheric surfaces with different vector height change rates are sampled by the equal arc length trajectory point model. Under the same sampling accuracy as the plane equidistant grid scanning trajectory point model, the change rate of the trajectory point spacing to the surface shape is reduced from 70.72 % ~ 33.03 %to 25.18%~8.75 %. The simulation results show the effectiveness of the model.","PeriodicalId":502341,"journal":{"name":"Applied Optics and Photonics China","volume":"240 1","pages":"1296403 - 1296403-10"},"PeriodicalIF":0.0000,"publicationDate":"2023-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"High steepness aspheric polishing trajectory planning based on equal arc length sampling\",\"authors\":\"Xuefei Zhao, Shanshan Wang, Nansheng Zhang, Qun Hao, Feng Shi\",\"doi\":\"10.1117/12.3000163\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"As a kind of common aspheric element, high-gradient aspheric surface is more and more used in high-tech fields because of its advantages of improving system accuracy and optimizing system comprehensive performance. At the same time, it also has higher requirements for its surface processing quality. The trajectory planning in polishing is an important part that affects the surface quality of the component. Due to the continuous change of the curvature radius of the high-steep aspheric surface and the large change rate of the vector height, the commonly used planar equidistant grating scanning trajectory is projected onto its surface. The distribution of trajectory points on the surface is obviously uneven, resulting in over polishing or under polishing in some areas. In order to ensure the machining accuracy of high-gradient aspheric surface, the concept of “common equal arc length point” is proposed and the equal arc length trajectory point planning model is established to make the spatial distance of any adjacent trajectory points on the aspheric surface consistent, and the spatial interval change rate is introduced to quantitatively analyze the distribution of trajectory points. Several aspheric surfaces with different vector height change rates are sampled by the equal arc length trajectory point model. Under the same sampling accuracy as the plane equidistant grid scanning trajectory point model, the change rate of the trajectory point spacing to the surface shape is reduced from 70.72 % ~ 33.03 %to 25.18%~8.75 %. The simulation results show the effectiveness of the model.\",\"PeriodicalId\":502341,\"journal\":{\"name\":\"Applied Optics and Photonics China\",\"volume\":\"240 1\",\"pages\":\"1296403 - 1296403-10\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-12-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Applied Optics and Photonics China\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.3000163\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied Optics and Photonics China","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.3000163","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

高梯度非球面作为一种常见的非球面元件,因其具有提高系统精度、优化系统综合性能等优点,在高科技领域的应用越来越广泛。同时,它也对其表面加工质量提出了更高的要求。抛光中的轨迹规划是影响部件表面质量的重要环节。由于高阶非球面表面曲率半径不断变化,矢量高度变化率大,常用的平面等距光栅扫描轨迹要投射到其表面。轨迹点在表面的分布明显不均匀,导致某些区域抛光过度或抛光不足。为了保证高梯度非球面的加工精度,提出了 "公共等弧长点 "的概念,建立了等弧长轨迹点规划模型,使非球面上任意相邻轨迹点的空间距离一致,并引入空间间隔变化率对轨迹点的分布进行定量分析。通过等弧长轨迹点模型对不同矢量高度变化率的多个非球面进行采样。在与平面等距网格扫描轨迹点模型相同的采样精度下,轨迹点间距对曲面形状的变化率从 70.72 % ~ 33.03 % 降低到 25.18 % ~ 8.75 %。仿真结果表明了该模型的有效性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High steepness aspheric polishing trajectory planning based on equal arc length sampling
As a kind of common aspheric element, high-gradient aspheric surface is more and more used in high-tech fields because of its advantages of improving system accuracy and optimizing system comprehensive performance. At the same time, it also has higher requirements for its surface processing quality. The trajectory planning in polishing is an important part that affects the surface quality of the component. Due to the continuous change of the curvature radius of the high-steep aspheric surface and the large change rate of the vector height, the commonly used planar equidistant grating scanning trajectory is projected onto its surface. The distribution of trajectory points on the surface is obviously uneven, resulting in over polishing or under polishing in some areas. In order to ensure the machining accuracy of high-gradient aspheric surface, the concept of “common equal arc length point” is proposed and the equal arc length trajectory point planning model is established to make the spatial distance of any adjacent trajectory points on the aspheric surface consistent, and the spatial interval change rate is introduced to quantitatively analyze the distribution of trajectory points. Several aspheric surfaces with different vector height change rates are sampled by the equal arc length trajectory point model. Under the same sampling accuracy as the plane equidistant grid scanning trajectory point model, the change rate of the trajectory point spacing to the surface shape is reduced from 70.72 % ~ 33.03 %to 25.18%~8.75 %. The simulation results show the effectiveness of the model.
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