沉积在水平固体表面的小无柄液滴的蒸发:新的精确解与近似解

IF 2.5 Q3 CHEMISTRY, PHYSICAL
Peter Lebedev-Stepanov, Olga Savenko
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引用次数: 0

摘要

蒸发沉积在水平表面上的无柄液滴是应用(印刷技术、电子学、传感学、医学诊断、疏水涂层等)和理论研究(微流体学、纳米颗粒自组装、溶质结晶等)的重要对象。本文回顾了计算沉积在平坦固体表面的毛细尺寸轴对称液滴缓慢蒸发的公式库。考虑了蒸汽密度、蒸发通量密度和总蒸发率等特征。介绍了在麦克斯韦模型框架下获得的精确解,在该模型中,液滴的蒸发过程受到从液滴表面到周围空气的蒸汽扩散的限制。总结既包括过去几十年中获得的著名成果,也包括我们在过去几年中发表的新成果,但实际上并不为更广泛的科学界所知。此外,还介绍了尚未在权威刊物上发表的最新公式,这些公式涉及一些特定接触角的精确解。此外,还给出了新的近似解(在整个接触角 θ∈[0, π]范围内,单位时间内单位表面积的总蒸发率和质量损失,恒定接触半径蒸发机制和恒定接触角模式下的液滴寿命),可用于建模而无需大量计算资源。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Evaporation of Small Sessile Drop Deposited on a Horizontal Solid Surface: New Exact Solutions and Approximations
Evaporating a liquid sessile drop deposited on a horizontal surface is an important object of applications (printing technologies, electronics, sensorics, medical diagnostics, hydrophobic coatings, etc.) and theoretical investigations (microfluidics, self-assembly of nanoparticles, crystallization of solutes, etc.). The arsenal of formulas for calculating the slow evaporation of an axisymmetric drop of capillary dimensions deposited on a flat solid surface is reviewed. Characteristics such as vapor density, evaporation flux density, and total evaporation rate are considered. Exact solutions obtained in the framework of the Maxwellian model, in which the evaporation process of the drop is limited by vapor diffusion from the drop surface to the surrounding air, are presented. The summary covers both well-known results obtained during the last decades and new results published by us in the last few years, but practically unknown to the wider scientific community. The newest formulas, not yet published in refereed publications, concerning exact solutions for a number of specific contact angles are also presented. In addition, new approximate solutions are presented (total evaporation rate and mass loss per unit surface area per unit time in the whole range of contact angles θ∈[0,​​​  π), drop lifetime in constant contact radius evaporation regime and constant contact angle mode), which can be used in modeling without requiring significant computational resources.
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来源期刊
Colloids and Interfaces
Colloids and Interfaces CHEMISTRY, PHYSICAL-
CiteScore
3.90
自引率
4.20%
发文量
64
审稿时长
10 weeks
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