Thickness dependence of VO2 microstructure and phase transition properties deposited on ITO substrate

Vanadium dioxide is one of the reversible phase transition materials, which can be induced by temperature, electric field, laser, stress, etc. This characteristic makes thin films have great potential applications in fields of various optoelectronic devices. For electro-optical switch applications, a high extinction ratio and low threshold voltage are required, which are closely related to the VO2 film thickness. In this paper, VO2 thin films with different thicknesses were deposited on ITO substrates by pulsed magnetron sputtering. Microstructure, optical and electrical properties, and phase transition performance of the samples are investigated. The research results have a high reference value for the design of high-performance VO2-based electro-optic switches.