采用不同材料的 45° 入射角近红外激光减反射膜涂层的阻抗比较

Yuanyuan Liu, Jianhua Chen, JIanqi Yuan, Jianing Dong, Baoyu Zhang
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引用次数: 0

摘要

鉴于激光相关产品中对具有一定入射角的光学元件的应用要求,我们对使用常用薄膜材料组合 HfO2-SiO2 和薄膜材料组合 ZrO2-MgF2 沉积的入射角为 45°的 1064nm 抗反射膜进行了激光损伤测量,并比较了两种样品的抗激光诱导损伤能力。使用不同薄膜材料制备的两组实验均在配备无油真空泵的蒸发镀膜设备中进行。然后分别设计了薄膜结构、制定了工艺方案并得到了样品。测量了两个样品的 LIDT,并对结果进行了分析和比较。结果表明,在工艺条件适合材料的情况下,ZrO2-MgF2 组合薄膜材料沉积的薄膜性能良好。在相似的工艺条件下,薄膜材料组合 ZrO2-MgF2 的抗激光诱导损伤性能与薄膜材料组合 HfO2-SiO2 相似。今后可加强对 ZrO2-MgF2 材料的研究。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Resistance comparison of 45° incident angle NIR laser anti-reflection film coating with different materials
In view of the application requirements of optical elements with some incident angle in laser-related products, laser damage measurement were carried out on 1064nm anti-reflection films with an incident angle of 45° deposited with the commonly used film materials combination HfO2-SiO2 and film materials combination ZrO2-MgF2, and the resistance of laser induced damage of the two samples was compared. Two groups of experiments prepared with different film materials were carried out in evaporation coating equipment equipped vacuum pump without oil. Then we designed the film structure, formulated the process plan and got the sample respectively. LIDT of two samples were measured, and the results were analyzed and compared. The results show that the film deposited by the film materials combination ZrO2-MgF2 performed well when the process conditions were suitable for the materials. And the resistance of laser induced damage performed similar to the film materials combination HfO2-SiO2 under similar process conditions. The research about material ZrO2-MgF2 may be strengthened in the future.
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