温度对双层氮化硼拉伸和振动特性的影响

Demin Zhao, Kexin Fang
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引用次数: 0

摘要

六方氮化硼(h-BN)是一种具有宽带隙的半导体材料,在微电子领域的导热设备和纳米声纳器中具有广阔的应用前景。本文模拟分子动力学研究了双层 h-BN 在五种不同堆叠模式下的拉伸和振动行为。重点研究了 h-BN 在不同温度下的五种不同堆叠模式的力学性能,包括杨氏模量、极限应力和极限应变。结果表明,双层 h-BN 纳米片表现出各向异性的特征,其拉伸性能随着温度的升高而降低。此外,我们还探讨了温度对五种不同堆叠模式下双层 h-BN 固有频率的影响。这些结果从根本上理解了双层 h-BN 纳米片在不同堆叠模式下的机械和振动特性,有助于它们在超高温环境下工作的先进纳米器件中的潜在应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of temperature on tensile and vibration properties of bilayer boron nitride
Hexagonal boron nitride (h-BN) is a semiconductor material with a wide band gap, holding promising potential for applications in thermal conductivity devices and nanoresonators in the field of microelectronics. Here, molecular dynamics is simulated to investigate the tensile and vibrational behaviors of bilayer h-BN under five different stacking modes across varying temperatures. The mechanical properties of five different stacking modes of h-BN at various temperatures are focused on, including Young's modulus, the ultimate stress, and the ultimate strain. Results indicate that bilayer h-BN nanosheets exhibit anisotropic characteristics, with their tensile properties decreasing as temperature increases. Additionally, we explore the influence of temperature on the natural frequency of bilayer h-BN under five different stacking modes. These results establish a fundamental understanding of the mechanical and vibrational characteristics of bilayer h-BN nanosheets under different stacking modes, contributing to their potential applications in advanced nanodevices operating in extremely high-temperature environments.
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