带有磁聚焦电子束的点场发射电子源

IF 2.1 3区工程技术 Q2 MICROSCOPY

Ultramicroscopy Pub Date : 2023-12-21 DOI:10.1016/j.ultramic.2023.113911

Paweł Urbański, Piotr Szyszka, Marcin Białas, Tomasz Grzebyk

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引用次数: 0

摘要

本文介绍了一种场发射器，其形式是在硅尖上覆盖一层碳纳米管。发射的光束通过一组两个静电透镜和磁场聚焦，这在此类结构中尚属首次。所提出的方法取得了非常有前景的结果。场发射器能够提供较高的发射电流（约 50 µA）和均匀的小光斑光束。这种电子源是许多微型微机电系统和纳米电子器件的必要组成部分。该电子源特别适用于目前开发的微机电系统 X 射线源和微机电系统电子显微镜。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Point field emission electron source with a magnetically focused electron beam

This paper presents a field emitter in the form of a silicon tip covered with a layer of carbon nanotubes. The emitted beam is focused with a set of two electrostatic lenses and – which is novelty in such structures – with a magnetic field. The presented approach gave very promising results. The field emitter was able to provide a high emission current (about 50 µA) and a beam with a small and homogeneous spot. Such electron sources are necessary components of many miniature MEMS and nanoelectronics devices. The presented source is dedicated especially for the use in currently developed MEMS X-ray sources and MEMS electron microscopes.

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来源期刊

Ultramicroscopy 工程技术-显微镜技术

CiteScore

4.60

自引率

13.60%

发文量

117

审稿时长

5.3 months

期刊介绍： Ultramicroscopy is an established journal that provides a forum for the publication of original research papers, invited reviews and rapid communications. The scope of Ultramicroscopy is to describe advances in instrumentation, methods and theory related to all modes of microscopical imaging, diffraction and spectroscopy in the life and physical sciences.