4 兆电子伏氦离子束辐照对钨表面结构损伤的特征

IF 0.5 Q4 PHYSICS, NUCLEAR
O. Manuilenko, E. Prokhorenko, K. V. Pavlii, B. V. Zajtsev, S.N. Dubniuk, V. Lytvynenko, T. G. Prokhorenko
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引用次数: 0

摘要

氦离子束(EHe+= 4 МeV)对纯度为 99.5% 的钨样品产生了影响。对钨的辐射特性进行了研究。氦离子束的辐照导致了特性的变化。根据钨层的深度(最大深度为 6.1 μm),获得了空位和声子数量的数值。还发现了钨表面原子的溅射系数。氦离子的平均自由路径达 70 μm。结果表明,表面的最大破坏发生在凹坑区域。凹坑出现的次数是气泡的五倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
FEATURES OF STRUCTURAL DAMAGES OF SURFACE OF TUNGSTEN AS A RESULT OF IRRADIATION WITH HELIUM ION BEAMS WITH ENERGY 4 MeV
The beams of ions of helium (EHe+= 4 МeV) affected samples of tungsten with purity 99.5%. The radiation characteristics of tungsten have been studied. The change in characteristics was caused by irradiation with helium ion beams. Numerical values of the number of vacancies and phonons were obtained depending on the depth of the layer in tungsten (maximum at a depth of 6.1 μm). The sputtering coefficients of atoms from the surface of tungsten are found. The mean free path of helium ions was up to 70 μm. It is determined that the maximum destruction of the surface occurs in the region of the pits. Pits appear in five times more than bubbles.
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来源期刊
CiteScore
0.70
自引率
50.00%
发文量
0
审稿时长
2-4 weeks
期刊介绍: The journal covers the following topics: Physics of Radiation Effects and Radiation Materials Science; Nuclear Physics Investigations; Plasma Physics; Vacuum, Pure Materials and Superconductors; Plasma Electronics and New Methods of Acceleration.
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