热辐射和高阶化学反应条件下滑动弯曲表面上的磁驱动纳米流体流动

IF 1.8 4区 物理与天体物理 Q3 PHYSICS, APPLIED
Suprakash Maity, P. K. Kundu
{"title":"热辐射和高阶化学反应条件下滑动弯曲表面上的磁驱动纳米流体流动","authors":"Suprakash Maity, P. K. Kundu","doi":"10.1142/s0217984924501318","DOIUrl":null,"url":null,"abstract":"In this paper, nanofluid flow is considered on curved stretching surface under magnetic influence. Realistic velocity slip together with convective boundary condition is imported. The system is also blessed with radiation and higher order chemical reaction. Active and passive controls of nanoparticles are considered and under both boundary conditions the flow analysis is compared. Leading equations of the system is a set of partial differential equations which are transfigured by similarity variable into a set of highly nonlinear ordinary differential equations (ODEs). The system is solved by the Runge–Kutta fourth-order method (RK-4) with shooting technique. The simulation is done by MAPLE-2021 software. Outcomes are portrayed by several graphs and tables and comparison diagram for different conditions is also included. Velocity lines are compared for suction and injection effect but thermal and concentration profiles are compared under active and passive controls of nanoparticles. The velocity profile changed by 16.55% for higher magnetic profile and the mass transfer changed by 3.57% for actively controlled flow under velocity slip parameter. Chemical reaction parameter detained the concentration profile for both active and passive controls but gave lower magnitude for passively controlled flow.","PeriodicalId":18570,"journal":{"name":"Modern Physics Letters B","volume":"41 24","pages":""},"PeriodicalIF":1.8000,"publicationDate":"2023-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Magnetically-driven nanofluid flow over a slippery-bended surface under thermal radiation and higher order chemical reaction\",\"authors\":\"Suprakash Maity, P. K. Kundu\",\"doi\":\"10.1142/s0217984924501318\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, nanofluid flow is considered on curved stretching surface under magnetic influence. Realistic velocity slip together with convective boundary condition is imported. The system is also blessed with radiation and higher order chemical reaction. Active and passive controls of nanoparticles are considered and under both boundary conditions the flow analysis is compared. Leading equations of the system is a set of partial differential equations which are transfigured by similarity variable into a set of highly nonlinear ordinary differential equations (ODEs). The system is solved by the Runge–Kutta fourth-order method (RK-4) with shooting technique. The simulation is done by MAPLE-2021 software. Outcomes are portrayed by several graphs and tables and comparison diagram for different conditions is also included. Velocity lines are compared for suction and injection effect but thermal and concentration profiles are compared under active and passive controls of nanoparticles. The velocity profile changed by 16.55% for higher magnetic profile and the mass transfer changed by 3.57% for actively controlled flow under velocity slip parameter. Chemical reaction parameter detained the concentration profile for both active and passive controls but gave lower magnitude for passively controlled flow.\",\"PeriodicalId\":18570,\"journal\":{\"name\":\"Modern Physics Letters B\",\"volume\":\"41 24\",\"pages\":\"\"},\"PeriodicalIF\":1.8000,\"publicationDate\":\"2023-12-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Modern Physics Letters B\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1142/s0217984924501318\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"PHYSICS, APPLIED\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Modern Physics Letters B","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1142/s0217984924501318","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
引用次数: 0

摘要

本文考虑了磁场影响下弯曲拉伸表面上的纳米流体流动。导入了真实的速度滑移和对流边界条件。系统还受到辐射和高阶化学反应的影响。考虑了纳米粒子的主动和被动控制,并对两种边界条件下的流动分析进行了比较。系统的先导方程是一组偏微分方程,通过相似性变量转换成一组高度非线性的常微分方程(ODE)。该系统采用带有射击技术的 Runge-Kutta 四阶方法 (RK-4) 求解。模拟由 MAPLE-2021 软件完成。模拟结果通过几幅图和表进行了描述,还包括不同条件下的对比图。比较了吸入和注入效应的速度线,还比较了纳米粒子在主动和被动控制下的热曲线和浓度曲线。在速度滑移参数下,磁性较高的流速曲线变化了 16.55%,主动控制流动的传质变化了 3.57%。化学反应参数对主动和被动控制下的浓度曲线都有影响,但对被动控制的流动影响较小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Magnetically-driven nanofluid flow over a slippery-bended surface under thermal radiation and higher order chemical reaction
In this paper, nanofluid flow is considered on curved stretching surface under magnetic influence. Realistic velocity slip together with convective boundary condition is imported. The system is also blessed with radiation and higher order chemical reaction. Active and passive controls of nanoparticles are considered and under both boundary conditions the flow analysis is compared. Leading equations of the system is a set of partial differential equations which are transfigured by similarity variable into a set of highly nonlinear ordinary differential equations (ODEs). The system is solved by the Runge–Kutta fourth-order method (RK-4) with shooting technique. The simulation is done by MAPLE-2021 software. Outcomes are portrayed by several graphs and tables and comparison diagram for different conditions is also included. Velocity lines are compared for suction and injection effect but thermal and concentration profiles are compared under active and passive controls of nanoparticles. The velocity profile changed by 16.55% for higher magnetic profile and the mass transfer changed by 3.57% for actively controlled flow under velocity slip parameter. Chemical reaction parameter detained the concentration profile for both active and passive controls but gave lower magnitude for passively controlled flow.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Modern Physics Letters B
Modern Physics Letters B 物理-物理:凝聚态物理
CiteScore
3.70
自引率
10.50%
发文量
235
审稿时长
5.9 months
期刊介绍: MPLB opens a channel for the fast circulation of important and useful research findings in Condensed Matter Physics, Statistical Physics, as well as Atomic, Molecular and Optical Physics. A strong emphasis is placed on topics of current interest, such as cold atoms and molecules, new topological materials and phases, and novel low-dimensional materials. The journal also contains a Brief Reviews section with the purpose of publishing short reports on the latest experimental findings and urgent new theoretical developments.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信