Particle-in-cell simulations of high frequency capacitively coupled plasmas including spatially localised inductive-like heating

High frequency (HF) capacitively coupled plasmas (CCPs) are ubiquitous, having several industrial applications, especially in the semiconductor industry. Inductive heating effects within these plasmas play an important role and therefore understanding them is key to improve industrial applications. For this purpose kinetic research, using particle-in-cell (PIC) codes, offers significant opportunity to study, and improve, industrial plasma processes that operate at the atomic level. However, PIC codes commonly used for CCPs are electrostatic and thus cannot be used to simulate electromagnetically induced currents. Therefore we have developed EPOCH-LTP, a 1D PIC code with a current heating model, that enables the simulation of inductive heating effects in HF CCPs. First simulation results, from an HF CCP (60 MHz) operated at 1 mTorr of argon, show that inductive currents couple most of their power to the electrons at the interface between the bulk plasma and the sheath. Furthermore, the simulation of a dual-frequency CCP, where a HF inductive current and a low-frequency (LF) voltage waveform at 400 kHz are applied, have shown a synergy between the HF and LF waveforms that increase the inductive heating rate.