半导体制造中的光刻线调度

IF 2.2 3区工程技术 Q2 ENGINEERING, MULTIDISCIPLINARY

Engineering Optimization Pub Date : 2023-11-29 DOI:10.1080/0305215x.2023.2285416

Chia-Yen Lee, Cheng-Man Wu, Chia-Yi Hsu, Hui-Hua Xie, Yu-Hsueh Fang

引用次数: 0

摘要

在半导体动态随机存取存储器(DRAM)制造厂(fab)中，光刻工艺通常是一个主要的瓶颈，并且由于工艺特定的约束，使得光刻线调度变得复杂。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Lithography reticle scheduling in semiconductor manufacturing

The lithography process in semiconductor dynamic random-access memory (DRAM) fabrication plants (fabs) is usually a major bottleneck, and reticle scheduling is complicated by process-speciﬁc constr...

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来源期刊

Engineering Optimization 管理科学-工程：综合

CiteScore

5.90

自引率

7.40%

发文量

审稿时长

3.5 months

期刊介绍： Engineering Optimization is an interdisciplinary engineering journal which serves the large technical community concerned with quantitative computational methods of optimization, and their application to engineering planning, design, manufacture and operational processes. The policy of the journal treats optimization as any formalized numerical process for improvement. Algorithms for numerical optimization are therefore mainstream for the journal, but equally welcome are papers which use the methods of operations research, decision support, statistical decision theory, systems theory, logical inference, knowledge-based systems, artificial intelligence, information theory and processing, and all methods which can be used in the quantitative modelling of the decision-making process. Innovation in optimization is an essential attribute of all papers but engineering applicability is equally vital. Engineering Optimization aims to cover all disciplines within the engineering community though its main focus is in the areas of environmental, civil, mechanical, aerospace and manufacturing engineering. Papers on both research aspects and practical industrial implementations are welcomed.