在溴化物离子存在下，在铜单晶(111)表面上电沉积铜

Electrodeposition and Surface Treatment Pub Date : 1975-09-01 DOI:10.1016/0300-9416(75)90063-2

S. Nageswar

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引用次数: 0

摘要

用已知浓度为10-3 ~ 10-10 mol/l HBr的高纯度硫酸铜溶液，在铜的(111)平面上观察了铜的电沉积。锥形生长被截断并转变为层状生长，从而产生脊状生长，然后形成多晶沉积。在较高的电流密度下，从一种生长类型向另一种生长类型的转变是渐进的。

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Electrodeposition of copper on a copper single crystal (111) face in the presence of bromide ions

Observations were made of copper electrodeposits on the (111) plane of copper from highly purified solutions of copper sulphate containing known concentrations from 10^-3 to 10^-10 mol/l of HBr. The pyramidal growth becomes truncated and transforms to a layer growth which gives rise to ridges and then to a polycrystalline deposit. At higher current densities, transition from one type of growth to another is gradual.

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Electrodeposition and Surface Treatment

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