干气模型和湿蒸汽模型对太阳能驱动制冷喷射器系统影响的数值研究

IF 1 Q4 ENGINEERING, CHEMICAL
Honglun Cong, Jiao Zhang
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引用次数: 0

摘要

摘要:随着地球温度的不断升高,使用低污染的设备是必不可少的。喷射器被认为是无污染的设备之一,由于没有运动部件,故障率很低。此外,学者们最近也关注于提高工业设备的效率。为了提高蒸汽喷射器的性能,需要采用精确的建模方法。在蒸汽喷射器中,非平衡冷凝产生两相流的情况。本研究中使用的湿蒸汽模型表征了这种两相流。这项研究的目的是比较湿蒸汽模型和干气体模型。在湿蒸汽模型中,液体质量分数为0.25,其计算的夹带比低于干气体模型,与实验观察结果吻合较好。干气模型的最大马赫数约为5,湿蒸汽模型的最大马赫数约为4。两种模型之间存在显著的温差,干气体模型的温度低于湿蒸汽模型。在混合室、固定截面和扩散器中存在明显的对角激波和膨胀波。与干气模型相比,这些现象在湿蒸汽模型中以更大的强度和轻微的延迟发生。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Numerical investigation of the effects of dry gas model and wet steam model in solar-driven refrigeration ejector system
Abstract Nowadays, the use of equipment with little pollution is essential due to the increase in the planet’s temperature. Ejectors are considered one of the equipment with no pollution, and their failure rate is low due to the lack of moving parts. Also, scholars have recently focused on improving the efficiency of industrial equipment. The use of accurate modeling is required to improve steam ejector performance. In a steam ejector, non-equilibrium condensation creates a two-phase flow situation. The wet steam model, used in this study, characterizes this two-phase flow. The study’s objective was to compare this wet steam model with the dry gas model. In the wet steam model, the liquid mass fraction is 0.25, and its calculated entrainment ratio is lower than the dry gas model, closely matching experimental observations. The dry gas model reaches a maximum Mach number of about 5, while the wet steam model approximates 4. A significant temperature difference exists between the two models, with the dry gas model indicating lower temperatures compared to the wet steam model. Diagonal shocks and expansion waves are evident in the mixing chamber, fixed cross-section, and diffuser. These phenomena occur with greater intensity and a slight delay in the wet steam model compared to the dry gas model.
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来源期刊
Chemical Product and Process Modeling
Chemical Product and Process Modeling ENGINEERING, CHEMICAL-
CiteScore
2.10
自引率
11.10%
发文量
27
期刊介绍: Chemical Product and Process Modeling (CPPM) is a quarterly journal that publishes theoretical and applied research on product and process design modeling, simulation and optimization. Thanks to its international editorial board, the journal assembles the best papers from around the world on to cover the gap between product and process. The journal brings together chemical and process engineering researchers, practitioners, and software developers in a new forum for the international modeling and simulation community. Topics: equation oriented and modular simulation optimization technology for process and materials design, new modeling techniques shortcut modeling and design approaches performance of commercial and in-house simulation and optimization tools challenges faced in industrial product and process simulation and optimization computational fluid dynamics environmental process, food and pharmaceutical modeling topics drawn from the substantial areas of overlap between modeling and mathematics applied to chemical products and processes.
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