V. E. Gaishun, Ya. A. Kosenok, V. V. Vaskevich, O. I. Tyulenkova, V. E. Borisenko, N. S. Kovalchuk, A. N. Pyatlitski, S. V. Chumak
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Silicon wafer bonding by the glass-like sol-gel formed nanocomposite
We have herein developed a glass-forming composition and the related sol-gel technology for bonding monocrystalline silicon wafers to produce «silicon–insulator–silicon» structures. A possibility to fabricate defect-free glass-like bonding layers at the annealing temperature decreased to 1000–1100 °C is demonstrated. The composites obtained by the sol-gel method can be used in technological processes of formation of the solid compound of silicon wafers.