6.3:通过减少异物来改善超窄边框显示器的交叉线缺陷

Xintong Wang, Lihong Gui, Yanjun Song Cooper
{"title":"6.3:通过减少异物来改善超窄边框显示器的交叉线缺陷","authors":"Xintong Wang, Lihong Gui, Yanjun Song Cooper","doi":"10.1002/sdtp.16222","DOIUrl":null,"url":null,"abstract":"Cross line defects are stubborn problems which puzzles ultra narrow bezel displays for a long time. It not only seriously lower yield of ultra narrow bezel displays, but also is difficult to repair in cell processing by NRP (normal repair). In this paper we mainly describe improving cross line defects by decreasingforeign matter in the process of CVD (Chemical Vapor Deposition).","PeriodicalId":21706,"journal":{"name":"SID Symposium Digest of Technical Papers","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2023-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"6.3: Improving Cross Line Defects of Ultra Narrow Bezel Displays by Decreasing Foreign Matter\",\"authors\":\"Xintong Wang, Lihong Gui, Yanjun Song Cooper\",\"doi\":\"10.1002/sdtp.16222\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Cross line defects are stubborn problems which puzzles ultra narrow bezel displays for a long time. It not only seriously lower yield of ultra narrow bezel displays, but also is difficult to repair in cell processing by NRP (normal repair). In this paper we mainly describe improving cross line defects by decreasingforeign matter in the process of CVD (Chemical Vapor Deposition).\",\"PeriodicalId\":21706,\"journal\":{\"name\":\"SID Symposium Digest of Technical Papers\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-04-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"SID Symposium Digest of Technical Papers\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1002/sdtp.16222\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"SID Symposium Digest of Technical Papers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1002/sdtp.16222","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

跨线缺陷是长期困扰超窄边框显示器的顽症。它不仅严重降低了超窄边框显示器的良率,而且在细胞处理中难以通过正常修复(NRP)进行修复。本文主要介绍了通过减少化学气相沉积(CVD)过程中的异物来改善交叉缺陷的方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
6.3: Improving Cross Line Defects of Ultra Narrow Bezel Displays by Decreasing Foreign Matter
Cross line defects are stubborn problems which puzzles ultra narrow bezel displays for a long time. It not only seriously lower yield of ultra narrow bezel displays, but also is difficult to repair in cell processing by NRP (normal repair). In this paper we mainly describe improving cross line defects by decreasingforeign matter in the process of CVD (Chemical Vapor Deposition).
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