钇掺杂对ZnO薄膜光催化性能的影响

IF 0.9 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY
L. Hrytsak, B. Turko, V. Vasil’ev, Y. Eliyashevskyy, A. Kostruba, A. Hrytsak
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引用次数: 0

摘要

采用射频磁控溅射技术,在玻璃衬底上沉积了不同钇掺杂水平的氧化锌薄膜。研究了y掺杂质量浓度分别为0、2.4、3.9、4.7 wt. %时的光催化性能。研究表明,y掺杂显著提高了ZnO薄膜的光催化活性。结果表明,ZnO:Y为3.9 wt. %的样品在80 min内的降解效率最高,达到100%,降解速率常数最大,为9.6·10-2 min-1。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of yttrium doping on the photocatalytic properties of ZnO thin films
Zinc oxide films with different levels of yttrium doping are deposited on glass substrates, using radio-frequency magnetron sputtering. Photocatalytic properties were investigated for such Y-doping weight concentration: 0, 2.4, 3.9, 4.7 wt. %. The studies showed that the Y-doping significantly improves the photocatalytic activity of the ZnO thin films. It was shown that the ZnO:Y 3.9 wt. % presents the highest degradation efficiency of 100 % during 80 minutes and the largest rate constant 9.6 · 10-2 min-1 among all samples.
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来源期刊
CiteScore
1.70
自引率
14.30%
发文量
83
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