反应性溅射法的光学波导SiCO薄膜中的膜特性对气体压力的依赖性

Q4 Engineering
Hiroyuki Nikkuni, Hiroshi Ito, Yu Takatsuka
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引用次数: 0

摘要

在本研究中,实验研究了用于光导波压力传感器的反应溅射SiCO薄膜的光学和机械特性对气体压力的依赖关系。在氧气流量比为6%的条件下,将气压从0.3 ~ 1.0 Pa变化,制备了薄膜,并澄清了气压的依赖性。随着气体压力的增大,SiCO薄膜的光学带隙增大,形成透明的SiCO薄膜。折射率、杨氏模量和硬度随气体压力的增大而减小。将这种依赖关系与之前研究的氧气流入比依赖关系结合起来,得到了各种膜特性下气体压力与氧气流量比的一阶近似公式。基于该方程,在氧流入比-气压坐标上建立了氧流动比-气压平面上等带隙和等杨氏模量的轨迹,便于制作具有所需特性的波导。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
反応性スパッタリング法による光導波路用SiCO薄膜における膜特性のガス圧依存性
In this study, the gas pressure dependence of optical and mechanical characteristics in reactive sputtered SiCO thin films for optical guided-wave pressure sensors was experimentally investigated. Thin films were fabricated by varying the gas pressure from 0.3 to 1.0 Pa at an oxygen flow ratio of 6%, and the gas pressure dependences was clarified. As the gas pressure increased, the optical bandgap of the SiCO thin film increased, resulting in a transparent SiCO films. On the other hand, the refractive index, young’s modulus and hardness decreased with increasing gas pressure. Combining this dependence with the oxygen inflow ratio dependence of the previous study, the first-order approximation formula for the gas pressure and oxygen flow rate ratio for various film characteristics was obtained. Based on this equation, trajectories of equal bandgaps and equal young's moduli on the oxygen flow ratio - gas pressure plane were created on the oxygen influx ratio-gas pressure coordinates, making it easy to fabricate waveguides with desired characteristics.
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来源期刊
IEEJ Transactions on Sensors and Micromachines
IEEJ Transactions on Sensors and Micromachines Engineering-Mechanical Engineering
CiteScore
0.40
自引率
0.00%
发文量
105
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