电子产品中Cr-Ni、Cr-Ni - si和Fe-Ni系合金薄膜的升华和蒸发制备

V. A. Zelenin, E. O. Narushko, A. D. Gladinov
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引用次数: 0

摘要

研究了元素含量较低的Cr-Ni、Cr-Ni - si和Fe-Ni系合金的蒸发成膜过程。结果表明,由于Ni和Cr的熔融温度差异较大,采用升华法制备了镍铬合金薄膜。提出了蒸发器的设计方案,使膜的组成稳定。对Cr-Ni-Si系合金的共沸成分进行了计算。确定了真空蒸发过程中铁和镍的总压等压线在状态图上的位置。计算了Fe-Ni系合金的共沸成分,并进行了实验验证。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Formation of Films of Alloys of Cr–Ni, Cr–Ni–Si and Fe–Ni Systems by Sublimation and Evaporation Methods for Electronic Products
The processes of formation of films of alloys of the Cr–Ni, Cr–Ni–Si and Fe–Ni systems with a stab le elemental composition by evaporation methods are considered. It is shown that due to the large difference in the melting temperatures of Ni and Cr, nichrome films are obtained by sublimation. The design of the evaporator is proposed, which makes it possible to stabilize the composition of the films. Calculations of azeotropic compositions of alloys of the Cr–Ni–Si system have been carried out. The position of the isobars of the total pressure of iron and nickel on the state diagram was determined during evaporation in vacuum. The azeotropic composition of the alloy of the Fe–Ni system was calculated and experimentally verified.
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