Impact of Carbon Impurities on Air Stability of MOCVD 2D-MoS2

Metal–organic chemical vapor deposition (MOCVD) is a key method for scalable synthesis of two-dimensional transition metal dichalcogenide (2D-TMDC) layers. However, it faces several challenges, such as the unintentional co-deposition of carbon impurities resulting from the pyrolysis of metal–organic precursors. This study investigates the chemical features of carbon and its impact on the photoluminescence property and air stability of 2D-MoS2. Using X-ray photoemission spectroscopy (XPS), it was found that the carbon impurities show characteristics similar to those of sp2-bonded graphitic carbon. Upon prolonged (20–40 weeks) exposure to the atmosphere, the incorporated carbon appears to react with 2D-MoS2, forming a MoS2−xCx solid solution. At the same time, a gradual decrease in the S/Mo ratio implies the formation of sulfur vacancies was also observed. These two processes lead to crystal degradation over time, as evidenced by the gradual quenching of the Raman and photoluminescence (PL) peaks. More detailed PL analyses suggest a charge transfer mechanism between sp2-carbon/2D-MoS2 and 2D-MoS2/air-adsorbates, which, in the short term, could alter PL emissions and appear to further intensify the degradation of 2D-MoS2 in the long-term. The findings highlight the strong impact of unintentionally co-deposited carbon on the optical properties and air stability of MOCVD 2D-MoS2 layers.