光伏用n型CdTe:In:原位掺杂、类型验证和补偿效果

IF 7 3区 材料科学 Q1 ENERGY & FUELS
Theodore D C Hobson, Luke Thomas, Laurie J Phillips, Leanne A H Jones, Matthew J Smiles, Christopher H Don, Pardeep K Thakur, Huw Shiel, Stephen Campbell, Vincent Barrioz, Vin Dhanak, Tim Veal, Jonathan D Major, Ken Durose
{"title":"光伏用n型CdTe:In:原位掺杂、类型验证和补偿效果","authors":"Theodore D C Hobson, Luke Thomas, Laurie J Phillips, Leanne A H Jones, Matthew J Smiles, Christopher H Don, Pardeep K Thakur, Huw Shiel, Stephen Campbell, Vincent Barrioz, Vin Dhanak, Tim Veal, Jonathan D Major, Ken Durose","doi":"10.1088/2515-7655/acfbf8","DOIUrl":null,"url":null,"abstract":"Abstract We explored the in-situ doping of cadmium telluride thin films with indium to produce n-type absorbers as an alternative to the near-universal choice of p-type for photovoltaic devices. The films were grown by close space sublimation from melt-synthesised feedstock. Transfer of the indium during film growth was limited to 0.0014%–0.014%—unless reducing conditions were used which yielded 14%–28% efficient transport. While chunks of bulk feedstock were verified as n-type by the hot probe method, carrier type of thin film material was only able to be verified by using hard x-ray photoelectron spectroscopy to determine the Fermi level position within the band gap. The assignment of n-type conductivity was consistent with the rectification behaviour of a p-InP/CdTe:In junction. However, chloride treatment had the effect of compensating n-CdTe:In to near-intrinsic levels. Without chloride, the highest dopant activation was 20% of the chemical concentration of indium, this being for a film having a carrier concentration of n = 2 × 10 15 cm −3 . However, the activation was often much lower, and compensation due to over-doping with indium and native defects (stoichiometry) are discussed. Results from preliminary bifacial devices comprising Au/P3HT/ZnTe/CdTe:In/CdS/FTO/glass are presented.","PeriodicalId":48500,"journal":{"name":"Journal of Physics-Energy","volume":"4 1","pages":"0"},"PeriodicalIF":7.0000,"publicationDate":"2023-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"n-type CdTe:In for photovoltaics: in situ doping, type verification and compensation effects\",\"authors\":\"Theodore D C Hobson, Luke Thomas, Laurie J Phillips, Leanne A H Jones, Matthew J Smiles, Christopher H Don, Pardeep K Thakur, Huw Shiel, Stephen Campbell, Vincent Barrioz, Vin Dhanak, Tim Veal, Jonathan D Major, Ken Durose\",\"doi\":\"10.1088/2515-7655/acfbf8\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Abstract We explored the in-situ doping of cadmium telluride thin films with indium to produce n-type absorbers as an alternative to the near-universal choice of p-type for photovoltaic devices. The films were grown by close space sublimation from melt-synthesised feedstock. Transfer of the indium during film growth was limited to 0.0014%–0.014%—unless reducing conditions were used which yielded 14%–28% efficient transport. While chunks of bulk feedstock were verified as n-type by the hot probe method, carrier type of thin film material was only able to be verified by using hard x-ray photoelectron spectroscopy to determine the Fermi level position within the band gap. The assignment of n-type conductivity was consistent with the rectification behaviour of a p-InP/CdTe:In junction. However, chloride treatment had the effect of compensating n-CdTe:In to near-intrinsic levels. Without chloride, the highest dopant activation was 20% of the chemical concentration of indium, this being for a film having a carrier concentration of n = 2 × 10 15 cm −3 . However, the activation was often much lower, and compensation due to over-doping with indium and native defects (stoichiometry) are discussed. Results from preliminary bifacial devices comprising Au/P3HT/ZnTe/CdTe:In/CdS/FTO/glass are presented.\",\"PeriodicalId\":48500,\"journal\":{\"name\":\"Journal of Physics-Energy\",\"volume\":\"4 1\",\"pages\":\"0\"},\"PeriodicalIF\":7.0000,\"publicationDate\":\"2023-09-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Physics-Energy\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1088/2515-7655/acfbf8\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"ENERGY & FUELS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Physics-Energy","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/2515-7655/acfbf8","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENERGY & FUELS","Score":null,"Total":0}
引用次数: 0

摘要

摘要:我们探索了碲化镉薄膜与铟的原位掺杂,以生产n型吸收剂,作为光伏器件中几乎普遍选择的p型吸收剂的替代方案。薄膜是用熔融合成的原料通过近距离升华生长的。在薄膜生长过程中,铟的转移被限制在0.0014% - 0.014%之间,除非使用还原条件,从而产生14%-28%的效率转移。块状原料可以通过热探针方法验证为n型,而载流子类型的薄膜材料只能通过硬x射线光电子能谱来确定带隙内的费米能级位置来验证。n型电导率的分配与p-InP/CdTe:In结的整流行为一致。然而,氯化物处理有补偿n-CdTe:In到接近内在水平的效果。在没有氯化物的情况下,掺杂剂的最高活化率为铟化学浓度的20%,这是对于载流子浓度为n = 2 × 10 15 cm−3的薄膜而言。然而,激活度往往很低,并且由于过量掺杂铟和天然缺陷(化学计量)的补偿进行了讨论。介绍了由Au/P3HT/ZnTe/CdTe:In/CdS/FTO/玻璃组成的双面器件的初步研究结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
n-type CdTe:In for photovoltaics: in situ doping, type verification and compensation effects
Abstract We explored the in-situ doping of cadmium telluride thin films with indium to produce n-type absorbers as an alternative to the near-universal choice of p-type for photovoltaic devices. The films were grown by close space sublimation from melt-synthesised feedstock. Transfer of the indium during film growth was limited to 0.0014%–0.014%—unless reducing conditions were used which yielded 14%–28% efficient transport. While chunks of bulk feedstock were verified as n-type by the hot probe method, carrier type of thin film material was only able to be verified by using hard x-ray photoelectron spectroscopy to determine the Fermi level position within the band gap. The assignment of n-type conductivity was consistent with the rectification behaviour of a p-InP/CdTe:In junction. However, chloride treatment had the effect of compensating n-CdTe:In to near-intrinsic levels. Without chloride, the highest dopant activation was 20% of the chemical concentration of indium, this being for a film having a carrier concentration of n = 2 × 10 15 cm −3 . However, the activation was often much lower, and compensation due to over-doping with indium and native defects (stoichiometry) are discussed. Results from preliminary bifacial devices comprising Au/P3HT/ZnTe/CdTe:In/CdS/FTO/glass are presented.
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来源期刊
CiteScore
10.90
自引率
1.40%
发文量
58
期刊介绍: The Journal of Physics-Energy is an interdisciplinary and fully open-access publication dedicated to setting the agenda for the identification and dissemination of the most exciting and significant advancements in all realms of energy-related research. Committed to the principles of open science, JPhys Energy is designed to maximize the exchange of knowledge between both established and emerging communities, thereby fostering a collaborative and inclusive environment for the advancement of energy research.
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