29‐4:用于显示应用的<10 μm像素尺寸阵列的高外量子效率和低电流密度注入

Yibo Liu, Mengyuan Zhanghu, Feng Feng, Zichun Li, Ka-Wah Chan, Hoi Sing Kwok, Zhaojun Liu
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引用次数: 0

摘要

本文采用氢氧化物处理和ALD钝化100 μm至3 μm的自对准工艺制备了氮化镓(GaN)基Micro - LED。在串联电阻分析的基础上,对不同的扩流性能进行了表征。然后通过电容演化测量证明了尺寸依赖性载流子浓度分布,确定了不同尺寸的载流子注入行为。最后,比较了阵列器件和单器件的外量子效率和亮度对电流密度的依赖关系,揭示了阵列器件在低电流密度下具有更高的效率,这有利于显示应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
29‐4: Higher External Quantum Efficiency with Lower Current Density Injection of <10 μm Pixel Size Arrays for Display Application
In this paper, the gallium nitride (GaN) based Micro‐LED was fabricated based on a self‐aligned process with hydroxide treatment and ALD passivation from 100 μm down to 3 μm. The different current spreading performance was characterized based on the series resistance analysis. Then the size‐dependent carrier concentration profile was demonstrated via the capacitancevoltage measurement, identifying the various carrier injection behavior by different size. Finally, the external quantum efficiency and luminance versus current density dependence for array device and the single device was compared, revealing a higher efficiency at lower current density for array device, which is favorable for display application.
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