室温下硬度压痕法研究单晶上金膜的非晶化

IF 1.5 4区材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY

Philosophical Magazine Pub Date : 2023-09-14 DOI:10.1080/14786435.2023.2255973

Akira Hatakeyama, Toshimasa Yoshiie

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引用次数: 0

摘要

摘要报道了用压痕法制备非晶金硅合金。通过气相沉积在硅(111)衬底上形成多晶金膜，使用负载0.05 n的Berkovich压痕器压痕，从背面(未压痕表面)减薄后，通过透射电子显微镜观察压痕区域。观察到一组晕环，确定为非晶金硅合金。在SiO2衬底上覆一层金膜也被用来研究衬底的影响，没有观察到非晶化。从热力学角度讨论了非晶化机理。关键词:压痕非晶硅透射电镜披露声明作者未报告潜在利益冲突。

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Amorphization of gold film on silicon single crystal by hardness indentation at room temperature

ABSTRACTThe formation of an amorphous gold-silicon alloy by indentation is reported. A polycrystalline gold film formed via vapour deposition on a silicon (111) substrate was indented using a Berkovich indenter with a load of 0.05 N. The indentation area was observed by transmission electron microscopy after thinning the silicon substrate from the back side (unindented surface). A set of halo rings, identified as an amorphous gold-silicon alloy was observed. A gold film on a SiO2 substrate was also used to investigate the effect of the substrate, and no amorphization was observed. The amorphization mechanism is discussed based on thermodynamics.KEYWORDS: Indentationamorphous silicontransmission electron microscopy Disclosure statementNo potential conflict of interest was reported by the author(s).

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来源期刊

Philosophical Magazine 工程技术-材料科学：综合

自引率

0.00%

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审稿时长

4.7 months

期刊介绍： The Editors of Philosophical Magazine consider for publication contributions describing original experimental and theoretical results, computational simulations and concepts relating to the structure and properties of condensed matter. The submission of papers on novel measurements, phases, phenomena, and new types of material is encouraged.