{"title":"四分之一和亚四分之一微米NMOSFET的热通道噪声","authors":"G. Knoblinger, P. Klein, U. Baumann","doi":"10.1109/ICMTS.2000.844412","DOIUrl":null,"url":null,"abstract":"We present a simple and efficient method for the extraction of thermal channel noise of MOSFET's in quarter and sub-quarter micron technologies from NF50 (noise figure at 50 ohm source resistance) measurements. For shorter channel lengths the experimental results shows a continuously rising deviation from the classical long channel theory. For a 0.18 /spl mu/m technology a /spl phi//spl ap/6 instead of 2/3 in saturation was extracted (increase of factor 9 compared to the long channel theory).","PeriodicalId":447680,"journal":{"name":"ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095)","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-03-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"24","resultStr":"{\"title\":\"Thermal channel noise of quarter and sub-quarter micron NMOSFET's\",\"authors\":\"G. Knoblinger, P. Klein, U. Baumann\",\"doi\":\"10.1109/ICMTS.2000.844412\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present a simple and efficient method for the extraction of thermal channel noise of MOSFET's in quarter and sub-quarter micron technologies from NF50 (noise figure at 50 ohm source resistance) measurements. For shorter channel lengths the experimental results shows a continuously rising deviation from the classical long channel theory. For a 0.18 /spl mu/m technology a /spl phi//spl ap/6 instead of 2/3 in saturation was extracted (increase of factor 9 compared to the long channel theory).\",\"PeriodicalId\":447680,\"journal\":{\"name\":\"ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095)\",\"volume\":\"7 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-03-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"24\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMTS.2000.844412\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.2000.844412","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Thermal channel noise of quarter and sub-quarter micron NMOSFET's
We present a simple and efficient method for the extraction of thermal channel noise of MOSFET's in quarter and sub-quarter micron technologies from NF50 (noise figure at 50 ohm source resistance) measurements. For shorter channel lengths the experimental results shows a continuously rising deviation from the classical long channel theory. For a 0.18 /spl mu/m technology a /spl phi//spl ap/6 instead of 2/3 in saturation was extracted (increase of factor 9 compared to the long channel theory).