尖端尺寸和形状对植入式CMOS神经探针插入力的影响

A. Perna, J. F. Ribeiro, G. Orbán, M. Vincenzi, F. Boi, G. Angotzi, L. Berdondini
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引用次数: 1

摘要

组织穿透神经探针实现高密度微电极阵列是现代神经科学的关键工具。当前探针实现长期稳定的皮质内神经接口的主要限制之一是它们在大脑中发生的生物反应。这种异物反应(FBR)是由探针在插入过程中引起的机械组织损伤引起的,预计这与进行植入所需的力有关。提高组织穿透高密度神经探针在脑组织内整合的一个潜在策略是优化它们的尺寸和几何形状,以最大限度地减少急性组织损伤和血脑屏障(BBB)破坏。这一策略预计将产生更有利的术后环境,减少慢性情况下FBR的程度。在这种情况下,插入组织穿透神经探针所需的力可以用作评估它们诱导的急性组织损伤程度的客观指标。本文报告了互补金属氧化物半导体(CMOS)探针几何参数对插入力的影响的初步研究结果,特别关注尖端尺寸和形状对插入前脑组织凹陷的重要性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Impact of Tip Size and Shape on the Insertion Force of Implantable CMOS Neural Probes
Tissue penetrating neural probes implementing high-density microelectrode arrays constitute a key tool of modern neuroscience. One of the main limitations of current probes to achieve chronically stable intracortical neural interfacing, is the biological reaction that they onset in the brain. Such foreign body reaction (FBR) is initiated by the mechanical tissue damage that the probes cause during their insertion, which is expected to be correlated with the force required to perform the implantation. One potential strategy to improve the integration of tissue penetrating high-density neural probes within brain tissue is to optimize their size and geometry in order to minimize acute tissue damage and Blood Brain Barrier (BBB) disruption. This strategy is foreseen to yield a more favorable postsurgical environment, reducing the extent of FBR in a chronic setting. In this context, the force required for the insertion of tissue penetrating neural probes can be used as an objective metric to assess the extent of acute tissue damage they induce. This paper reports preliminary findings on the impact of Complementary Metal Oxide Semiconductor (CMOS) probe geometrical parameters on insertion force, with a particular focus on the importance of tip size and shape on the dimpling of brain tissue before penetration.
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