化学束外延法高速生长Ga/sub 0.47/In/sub 0.53/As/InP

T. Uchida, T. Uchida, K. Mise, N. Yokouchi, F. Koyama, K. Iga
{"title":"化学束外延法高速生长Ga/sub 0.47/In/sub 0.53/As/InP","authors":"T. Uchida, T. Uchida, K. Mise, N. Yokouchi, F. Koyama, K. Iga","doi":"10.1109/ICIPRM.1990.203005","DOIUrl":null,"url":null,"abstract":"High growth rates have been obtained for Ga/sub 0.47/In/sub 0.53/As and InP using chemical beam epitaxy. The GaInAs growth rate was controlled over the range from 1.2 to 6 mu m/h, the latter being the highest growth rate obtained without sacrificing the optical and electrical properties of the crystal. Good thickness controllability was demonstrated by growing multi-quantum-wells at growth rates of 5.15 and 2.5 mu m/h. An emission wavelength shift from 1.56 mu m to 1.1 mu m was observed in room temperature photoluminescence measurements. Based on X-ray spectra satellite peaks, well widths associated with these wavelength ranged from 80 AA to 10 AA. The results agree with theoretical calculations and show good thickness controllability and wavelength tunability at high growth rates.<<ETX>>","PeriodicalId":138960,"journal":{"name":"International Conference on Indium Phosphide and Related Materials","volume":"28 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"High rate growth of Ga/sub 0.47/In/sub 0.53/As/InP by chemical beam epitaxy\",\"authors\":\"T. Uchida, T. Uchida, K. Mise, N. Yokouchi, F. Koyama, K. Iga\",\"doi\":\"10.1109/ICIPRM.1990.203005\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"High growth rates have been obtained for Ga/sub 0.47/In/sub 0.53/As and InP using chemical beam epitaxy. The GaInAs growth rate was controlled over the range from 1.2 to 6 mu m/h, the latter being the highest growth rate obtained without sacrificing the optical and electrical properties of the crystal. Good thickness controllability was demonstrated by growing multi-quantum-wells at growth rates of 5.15 and 2.5 mu m/h. An emission wavelength shift from 1.56 mu m to 1.1 mu m was observed in room temperature photoluminescence measurements. Based on X-ray spectra satellite peaks, well widths associated with these wavelength ranged from 80 AA to 10 AA. The results agree with theoretical calculations and show good thickness controllability and wavelength tunability at high growth rates.<<ETX>>\",\"PeriodicalId\":138960,\"journal\":{\"name\":\"International Conference on Indium Phosphide and Related Materials\",\"volume\":\"28 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-04-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Conference on Indium Phosphide and Related Materials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.1990.203005\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Indium Phosphide and Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1990.203005","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

采用化学束外延法对Ga/sub 0.47/In/sub 0.53/As和InP获得了较高的生长速率。GaInAs的生长速率控制在1.2 ~ 6 μ m/h之间,后者是在不牺牲晶体光学和电学性能的情况下获得的最高生长速率。以5.15和2.5 μ m/h的生长速率生长多量子阱,证明了良好的厚度可控性。在室温光致发光测量中观察到发射波长从1.56 μ m到1.1 μ m。根据x射线光谱卫星峰,与这些波长相关的井宽范围为80 AA至10 AA。结果与理论计算一致,在高生长速率下具有良好的厚度可控性和波长可调性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High rate growth of Ga/sub 0.47/In/sub 0.53/As/InP by chemical beam epitaxy
High growth rates have been obtained for Ga/sub 0.47/In/sub 0.53/As and InP using chemical beam epitaxy. The GaInAs growth rate was controlled over the range from 1.2 to 6 mu m/h, the latter being the highest growth rate obtained without sacrificing the optical and electrical properties of the crystal. Good thickness controllability was demonstrated by growing multi-quantum-wells at growth rates of 5.15 and 2.5 mu m/h. An emission wavelength shift from 1.56 mu m to 1.1 mu m was observed in room temperature photoluminescence measurements. Based on X-ray spectra satellite peaks, well widths associated with these wavelength ranged from 80 AA to 10 AA. The results agree with theoretical calculations and show good thickness controllability and wavelength tunability at high growth rates.<>
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信