si掺杂对ccu3ti4o12陶瓷性能的影响

Jinqiang He, Hui Wang, Chunjiang Lin, Jiajun Lin, Shengtao Li
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引用次数: 1

摘要

ccu3ti4o12 (CCTO)陶瓷作为介质材料在电容器和存储器件中具有潜在的应用前景,但如何进一步提高CCTO陶瓷的介电性能仍然是一个挑战。这种材料的介电性能可以通过组分的修饰来控制,而Si作为玻璃相应该会对CCTO陶瓷的性能产生影响,本工作研究了Si掺杂对ccu3ti4o12的影响,旨在改善ccu3ti4o12的介电特性。采用固相反应法在1050℃下合成了不同si掺杂浓度的CaCu3Ti4O12陶瓷,研究了掺杂和未掺杂的CaCu3Ti4O12的微观结构和介电性能。研究发现,添加的硅可以掺入到CaCu3Ti4O12的结构中,一定量的硅掺杂有利于晶粒长大,促进晶间相的析出,提高CaCu3Ti4O12陶瓷的致密性和均匀性。掺si的CaCu3Ti4O12样品的介电常数显著提高,同时介电损耗也较大。在不同频率下,介电常数ε”的温度依赖性表现为三组连续的本征弛豫极化峰,表明si掺杂对ccu3ti4o12陶瓷的弛豫机制影响不大。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The effects of Si-doping on the properties of CaCu3Ti4O12 ceramics
CaCu3Ti4O12 (CCTO) ceramics as a dielectric material are of potential applications in capacitors and memory devices, however, how to further improve the dielectric properties of CCTO ceramics is still a challenge. The dielectric behavior of this material can be manipulated via the modification in composition, and Si as a glass phase should have an impact on the properties of CCTO ceramics, this work investigated the effects of Si-doping on CaCu3Ti4O12 with the aim of improving dielectric characteristics. CaCu3Ti4O12 ceramics of various Si-doping concentrations were synthesized by solid state reaction method at 1050 C. The microstructure and the dielectric properties of Si-doped and undoped CaCu3Ti4O12 were studied. It is found that the added silicon can be incorporated into the structure of CaCu3Ti4O12, a certain amount of Si-doping would facilitate the grain growth, promote the precipitation of intergranular phase, and improve the compactness and homogeneity of CaCu3Ti4O12 ceramics. Si-doped CaCu3Ti4O12 samples show significantly higher dielectric constant, accompanied by larger dielectric loss. The temperature dependence of dielectric permittivity ε" for various frequencies shows three successive sets of peaks attributed to intrinsic relaxation polarization processes, suggesting that Si-doping has little influence on the relaxation mechanism of CaCu3Ti4O12 ceramics.
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