立方氮化硅的结构和力学性能:分子动力学研究

Nguyen Thi Thao, N. Ha, Le Van Vinh
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引用次数: 0

摘要

摘要:采用分子动力学模拟方法研究了立方氮化硅(c-Si3N4)在扩展变形下的显微组织和力学行为。对氮化硅样品在冷却过程和高压条件下进行了模拟。在T=300 K时,主要的氮(N)原子排列成fcc晶格,其余的N原子呈六方密排(hcp)和无序结构。hcp和无序N原子聚集在窄带中。对该样品的声子谱进行了计算和讨论。在这项工作中,我们还提出了应变立方氮化硅弹性模量作为体积应变函数的分子动力学预测。计算了c-Si3N4的杨氏模量和泊松比。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Structural and Mechanical Properties of Cubic Silicon Nitride: A Molecular Dynamics Study
Abstract: The molecular dynamics simulations have been used to study the microstructure as well as mechanical behavior of cubic silicon nitride (c-Si3N4) under the extended deformation. The silicon nitride sample was simulated under the cooling process and high pressure. At T=300 K, dominant nitrogen (N) atoms arrange into fcc lattice, and the rest of N atoms have hexagonal close-packed (hcp) and disordered structures. The hcp and disordered N atoms gather into the narrow bands. The phonon spectra of this sample are calculated and discussed. In this work we also present a molecular dynamics prediction for the elastic moduli in strained cubic silicon nitride as functions of the volumetric strain. Young’s modulus and Poisson’s ratio are also calculated for the  c-Si3N4.  
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