具有速度滑移和温度跳变的薄膜蒸发传热传质机理

Xiu Xiao, C. Yan, Yulong Ji
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引用次数: 0

摘要

固液界面速度滑移和温度跳变是微通道传热中的重要现象。为了理解薄膜蒸发过程的传热传质机理,建立了考虑速度滑移和固液界面温度跳变的综合数学模型。基于润滑理论、Clausius-Clapeyron方程和Young-Laplace方程建立了模型结构。为了更好地描述膜的蒸发过程,在模型中引入了三个无量纲参数,分别代表滑移长度系数、温度跳变和壁面过热度的影响。解析解提供了蒸发薄膜的膜厚和传热特性。结果表明,随着滑移长度和温度跳变系数的减小,蒸发薄膜区域的长度缩短,最大热流密度的位置向初始蒸发点靠近。滑移条件对热流密度的影响较小,但温度跳变的增加可以显著降低峰值热流密度。此外,通过对温度跳变、液膜传导和液汽界面蒸发三种热阻的分析,可以更好地理解薄膜蒸发过程中的有效传热。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Mechanisms of Heat and Mass Transfer for Thin-Film Evaporation With Velocity Slip and Temperature Jump
Velocity slip and temperature jump at the solid-liquid interface are important phenomena in microchannel heat transfer. A comprehensive mathematical model considering both velocity slip condition and temperature jump at the solid-liquid interface is developed to understand the mechanisms of heat and mass transfer during thin-film evaporation in this paper. The model structure is established based on the lubrication theory, Clausius-Clapeyron equation and Young-Laplace equation. To better formulate the film evaporation process, three dimensionless parameters representing the effects of slip length coefficient, temperature jump and wall superheat degree respectively, are introduced in the present model. The analytical solution provides insight of film thickness and heat transfer characteristics for the evaporating thin film. It shows that as the slip length and temperature jump coefficient decrease, the length of evaporating thin film region is shortened and the location of maximum heat flux moves closer to the initial evaporating point. The effect of slip condition on heat flux is small, but the increase of temperature jump can reduce the peak heat flux significantly. Furthermore, the analysis on the three thermal resistances which are caused by temperature jump, conduction through liquid film and evaporation on liquid-vapor interface result in a better understanding for effective heat transfer during thin-film evaporation.
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