电子-电子散射对半导体器件中载流子分布的影响

H. Kosina, M. Kampl
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引用次数: 1

摘要

人们普遍认为电子-电子散射(electron-electron scattering, EES)改变了能量分布函数的高能尾部[1][2],因此在热载子降解的物理建模中起着重要作用[3]。人们可以区分自洽模型和非自洽模型。自洽模型假设配对电子的实际或近似非平衡分布,而非自洽模型假设配对电子的平衡分布。后一种方法适用于描述通道热电子与漏极区冷电子库的相互作用。本文对该案例进行了研究。我们简要地讨论了单粒子散射率的推导和在蒙特卡罗模拟器中对抛物线带和全带结构的实现的细节。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of Electron-Electron Scattering on the Carrier Distribution in Semiconductor Devices
It is commonly accepted that electron-electron scattering (EES) alters the high-energy tail of the energy distribution function [1] [2], and thus plays an important role in the physically-based modeling of hot carrier degradation [3]. One can distinguish between selfconsistent models which assume the actual or an approximate non-equilibrium distribution for the partner electrons, and non-selfconsistent models which assume an equilibrium distribution for the partner electrons. The latter approach is suitable to describe the interaction of channel hot electrons with a reservoir of cold electrons in the drain region. This case is studied in the present work. We briefly discuss the details about the derivation of the single-particle scattering rate and the implementation in a Monte Carlo simulator for both parabolic bands and full-band structures.
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