原子力显微镜对相变薄膜短波记录光斑的显微结构观察

L. Men, Huiyong Liu, F. Jiang, F. Gan, Jielin Sun, Min‐qian Li
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引用次数: 0

摘要

采用射频磁控溅射法制备了GeSb2Te4相变薄膜。利用原子力显微镜(AFM)研究了短波记录光斑的微观结构。微区形貌图像显示激光照射后记录的区域凸起。随着书写脉冲宽度的增大,记录点中心出现凹陷。结果表明,原子力显微镜是一种非常有用的工具来评估记录的光斑,提高相变介质的性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Microstructural observation of short-wavelength recorded spots of phase-change thin film by atomic force microscopy
GeSb2Te4 phase change thin film was prepared by rf- magnetron sputtering method. Atomic force microscopy (AFM) was used to study the micro-structure of short-wavelength recorded spots. Microarea morphology images show that the recorded domain bulge after laser irradiation. With the increasing of writing pulse width, depression appears in the center of recorded spot. It is demonstrated that AFM is a very useful tool to evaluate the recorded spots and improve the performance of phase change media.
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