聚二甲基硅氧烷软模超分辨纳米光刻技术

2016 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) Pub Date : 2016-07-01 DOI:10.1109/3M-NANO.2016.7824990

Xiaochun Dong, Chuan-wang He, Pinghe Wang

{"title":"聚二甲基硅氧烷软模超分辨纳米光刻技术","authors":"Xiaochun Dong, Chuan-wang He, Pinghe Wang","doi":"10.1109/3M-NANO.2016.7824990","DOIUrl":null,"url":null,"abstract":"We report the design, analysis, and simulation of the superresolution nanolithography technique based on PDMS soft mold, which obtained the feature size smaller than 1/10 operating wavelength. The proposed nanolithography system consist of a periodic PDMS soft transparent mold, a thin silver layer, photoresist and substrate. The reason why we employ the PDMS soft mold is it can contact perfectly with silver layer. By adjusting the linewidth and the thickness of the silver layer, the optimal contrast were obtained. To analysis the superresolution nanolithography of proposed system, the electric field distributions and electric field intensity are given.","PeriodicalId":273846,"journal":{"name":"2016 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)","volume":"2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Superresolution nanolithography technique based on polydimethylsiloxane soft mold\",\"authors\":\"Xiaochun Dong, Chuan-wang He, Pinghe Wang\",\"doi\":\"10.1109/3M-NANO.2016.7824990\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We report the design, analysis, and simulation of the superresolution nanolithography technique based on PDMS soft mold, which obtained the feature size smaller than 1/10 operating wavelength. The proposed nanolithography system consist of a periodic PDMS soft transparent mold, a thin silver layer, photoresist and substrate. The reason why we employ the PDMS soft mold is it can contact perfectly with silver layer. By adjusting the linewidth and the thickness of the silver layer, the optimal contrast were obtained. To analysis the superresolution nanolithography of proposed system, the electric field distributions and electric field intensity are given.\",\"PeriodicalId\":273846,\"journal\":{\"name\":\"2016 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)\",\"volume\":\"2 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/3M-NANO.2016.7824990\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/3M-NANO.2016.7824990","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

本文报道了基于PDMS软模的超分辨率纳米光刻技术的设计、分析和仿真，获得了小于1/10工作波长的特征尺寸。所提出的纳米光刻系统由周期PDMS软透明模具、薄银层、光刻胶和衬底组成。我们之所以采用PDMS软模，是因为它能与银层完美接触。通过调整线宽和银层厚度，获得最佳对比度。为了分析该系统的超分辨纳米光刻性能，给出了系统的电场分布和电场强度。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Superresolution nanolithography technique based on polydimethylsiloxane soft mold

We report the design, analysis, and simulation of the superresolution nanolithography technique based on PDMS soft mold, which obtained the feature size smaller than 1/10 operating wavelength. The proposed nanolithography system consist of a periodic PDMS soft transparent mold, a thin silver layer, photoresist and substrate. The reason why we employ the PDMS soft mold is it can contact perfectly with silver layer. By adjusting the linewidth and the thickness of the silver layer, the optimal contrast were obtained. To analysis the superresolution nanolithography of proposed system, the electric field distributions and electric field intensity are given.

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来源期刊

2016 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)

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