螺旋放电处理对铜基凹版印刷PVD保护膜CrN粘接强度的影响

E. Rudenko, T. Kyrychok, V. Panarin, M. Svavilnyi, D. Polotsky, M. Skoryk, V. Baglai, N. Talimonova, A. Novytska
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引用次数: 0

摘要

研究了螺旋放电对单相黄铜L63表面浮雕形成及化学成分的影响。在加工过程中,揭示了黄铜基体喷涂层结构形成的两个阶段——表面浮雕的平滑和黄铜相成分的选择性喷涂,这将创造一个具有必要参数的表面,以增加保护CrN涂层的附着力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence of helicon discharge treatment on ensuring adhesive strength of protective PVD coating CrN on brass-based forms of intaglio printing
The influence of the helicon discharge on the formation of the relief and chemical composition of the surface of single phase brass L63 is investigated. Two stages of formation of the structure of the sprayed layer of brass substrate during processing are revealed - smoothing of the surface relief and selective spraying of phase components of brass, which will create a surface with the necessary parameters to increase the adhesion of protective CrN coating..
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