{"title":"硅的金刚石抛光","authors":"Robert E. Parks, C. Evans, A. Bartos","doi":"10.1364/oft.1994.otua1","DOIUrl":null,"url":null,"abstract":"Silicon is a widely used material in IR systems and electronics. Methods to rapidly produce surfaces of a specific geometry that are also free of subsurface damage lead to more cost effective manufacture of silicon products. In particular, we have been led to this study as a potential means of polishing diamond ground aspheric surfaces for IR imaging systems.","PeriodicalId":142307,"journal":{"name":"Optical Fabrication and Testing Workshop","volume":"15 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Diamond Polishing of Silicon\",\"authors\":\"Robert E. Parks, C. Evans, A. Bartos\",\"doi\":\"10.1364/oft.1994.otua1\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Silicon is a widely used material in IR systems and electronics. Methods to rapidly produce surfaces of a specific geometry that are also free of subsurface damage lead to more cost effective manufacture of silicon products. In particular, we have been led to this study as a potential means of polishing diamond ground aspheric surfaces for IR imaging systems.\",\"PeriodicalId\":142307,\"journal\":{\"name\":\"Optical Fabrication and Testing Workshop\",\"volume\":\"15 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optical Fabrication and Testing Workshop\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/oft.1994.otua1\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Fabrication and Testing Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/oft.1994.otua1","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Silicon is a widely used material in IR systems and electronics. Methods to rapidly produce surfaces of a specific geometry that are also free of subsurface damage lead to more cost effective manufacture of silicon products. In particular, we have been led to this study as a potential means of polishing diamond ground aspheric surfaces for IR imaging systems.
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