包括良率优化在内的运算放大器自动设计方法

L. Severo, A. Girardi
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引用次数: 2

摘要

本文提出了一种考虑亚微米工艺参数变化的CMOS运算放大器的自动尺寸调整方法。这些电路对工艺变化非常敏感,这会导致失配。所提出的方法包括同时优化功耗、栅极面积和良率预测,有效地探索了所有晶体管工作区域的设计空间。利用蒙特卡罗分析来估计产量,而蒙特卡罗分析只对优化过程中的最佳候选解执行。采用该方法设计了0.18μm工艺的Miller OTA和折叠级联放大器。结果表明,与没有良率预测的相同设计相比,电路良率有所提高,同时保持了功耗和面积预算以及合理的计算时间。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A methodology for the automatic design of operational amplifiers including yield optimization
This paper presents an automatic sizing methodology for CMOS operational amplifiers considering process parameter variations in submicron technologies. These circuits are very sensitive to process variations, which cause mismatch. The proposed methodology comprises simultaneous optimization of power dissipation, gate area and yield prediction, exploring effectively the design space in all transistor operation regions. Yield is estimated by Monte Carlo analysis, which is performed only for the best solutions candidates in the optimization procedure. A Miller OTA and a folded cascode amplifier are designed in 0.18μm technology using the proposed methodology. Results show the increase in the circuit yield comparing to the same design without yield prediction, while keeping the power and area budget and a reasonable computational time.
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