Si衬底上生长的垂直GaAs/GaP核壳纳米线的结构和光学特性

Jung-Hyun Kang, Q. Gao, H. Joyce, Y. Kim, Yanan Guo, Hong-yi Xu, J. Zou, M. Fickenscher, Leigh Morris Smith, H. Jackson, J. Yarrison-Rice, H. Tan, C. Jagadish
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引用次数: 0

摘要

在Si(111)衬底上生长砷化镓纳米线。通过在Si表面涂覆薄的GaAs缓冲层并采用双温生长,可以显著改善GaAs纳米线的形貌和晶体结构。在壳厚为25 nm的改进GaAs纳米线的基础上,应变GaAs/GaP核壳纳米线的发射能量较未应变的GaAs纳米线有260 meV的显著变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Structural and optical characterization of vertical GaAs/GaP core-shell nanowires grown on Si substrates
GaAs nanowires were grown on Si (111) substrates. By coating a thin GaAs buffer layer on Si surface and using a two-temperature growth, the morphology and crystal structure of GaAs nanowires were dramatically improved. The strained GaAs/GaP core-shell nanowires, based on the improved GaAs nanowires with a shell thickness of 25 nm, showed a significant shift in emission energy of 260 meV from the unstrained GaAs nanowires.
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