天体光子集成光学电路的超快激光刻录

Micro + Nano Materials, Devices, and Applications Pub Date : 2020-01-03 DOI:10.1117/12.2549180

S. Gross, T. Gretzinger, A. Arriola, G. Douglass, A. Ross-Adams, T. Fernandez, M. Withford

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引用次数: 0

摘要

超快激光刻字技术是一种在大块介质内制造低损耗三维光学电路的技术，它与各种光学材料兼容。其独特的功能和快速原型和快速迭代不同设计的能力使其对天文光子学非常有吸引力。本文综述了超快激光刻字的基本情况，并对其在恒星干涉测量等天体光子学领域的最新应用进展进行了综述。

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Ultrafast laser inscription of astrophotonic integrated optical circuits

Ultrafast laser inscription is a technique to create low-loss three dimensional optical circuits within bulk dielectrics that is compatible with a wide range of optical materials. Its unique capabilities and the ability to rapid prototype and quickly iterate through different designs has made it exceptionally attractive for astrophotonics. This paper will summarize the basic aspects of ultrafast laser inscription and review recent progress in its application to astrophotonics, such as stellar interferometry.

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Micro + Nano Materials, Devices, and Applications

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