C. Singh, S. Bhattacharya, Nafis Ahmed, P. Bhargav
{"title":"硼掺杂对太阳能电池用p型a-Si∶H薄膜光电性能的影响","authors":"C. Singh, S. Bhattacharya, Nafis Ahmed, P. Bhargav","doi":"10.1109/ICONCE.2014.6808678","DOIUrl":null,"url":null,"abstract":"We report the effect of boron doping on optical and electrical properties of p-type a-Si:H films. The p-type a-Si:H thin films have been deposited by RF-PECVD system varying the diborane flow rate from 5 sccm to 9 sccm. Enhancement in deposition rate from 30.3 nm/min to 33.6 nm reported with increasing diborane gas flow rate. Change in band gap, refractive index and Urbach energy with varying doping level is studied. An increase in dark conductivity is reported with increasing boron concentration. Solar cells fabricated with 4.63% efficiency.","PeriodicalId":109404,"journal":{"name":"2014 1st International Conference on Non Conventional Energy (ICONCE 2014)","volume":"95 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Effect of boron doping on optical and electrical properties of p-type a-Si∶H films for thin film solar cells application\",\"authors\":\"C. Singh, S. Bhattacharya, Nafis Ahmed, P. Bhargav\",\"doi\":\"10.1109/ICONCE.2014.6808678\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We report the effect of boron doping on optical and electrical properties of p-type a-Si:H films. The p-type a-Si:H thin films have been deposited by RF-PECVD system varying the diborane flow rate from 5 sccm to 9 sccm. Enhancement in deposition rate from 30.3 nm/min to 33.6 nm reported with increasing diborane gas flow rate. Change in band gap, refractive index and Urbach energy with varying doping level is studied. An increase in dark conductivity is reported with increasing boron concentration. Solar cells fabricated with 4.63% efficiency.\",\"PeriodicalId\":109404,\"journal\":{\"name\":\"2014 1st International Conference on Non Conventional Energy (ICONCE 2014)\",\"volume\":\"95 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2014 1st International Conference on Non Conventional Energy (ICONCE 2014)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICONCE.2014.6808678\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 1st International Conference on Non Conventional Energy (ICONCE 2014)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICONCE.2014.6808678","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Effect of boron doping on optical and electrical properties of p-type a-Si∶H films for thin film solar cells application
We report the effect of boron doping on optical and electrical properties of p-type a-Si:H films. The p-type a-Si:H thin films have been deposited by RF-PECVD system varying the diborane flow rate from 5 sccm to 9 sccm. Enhancement in deposition rate from 30.3 nm/min to 33.6 nm reported with increasing diborane gas flow rate. Change in band gap, refractive index and Urbach energy with varying doping level is studied. An increase in dark conductivity is reported with increasing boron concentration. Solar cells fabricated with 4.63% efficiency.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
