转移多层MoS2场效应晶体管的器件性能异常

L. Tong, Jingyi Ma, Xinyu Chen, Xiaojiao Guo, Saifei Gou, Yingdong Xia, Die Wang, Honglei Chen, W. Bao
{"title":"转移多层MoS2场效应晶体管的器件性能异常","authors":"L. Tong, Jingyi Ma, Xinyu Chen, Xiaojiao Guo, Saifei Gou, Yingdong Xia, Die Wang, Honglei Chen, W. Bao","doi":"10.1109/CAS52836.2021.9604120","DOIUrl":null,"url":null,"abstract":"Layered molybdenum disulfide (MoS2) is one of the representative two-dimensional (2D) semiconductors, offering a tantalizing prospect in the application of nanoelectronic devices and circuits. Here abnormal electrical and optoelectrical characteristics in transferred multilayer MoS2 transistors are observed and discussed. Such phenomena can be explained by the MoS2 intrinsic defects and the trapped charge impurities at the MoS2-dielectric and MoS2-MoS2 interfaces, as well as its charge screening effect. Our findings highlight the significance of controlling the dielectric interface and the material quality of 2D semiconductors, which are critical for the reliability of future 2D nanoelectronic devices.","PeriodicalId":281480,"journal":{"name":"2021 International Semiconductor Conference (CAS)","volume":"41 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-10-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Abnormal device performance in transferred multilayer MoS2 field-effect transistors\",\"authors\":\"L. Tong, Jingyi Ma, Xinyu Chen, Xiaojiao Guo, Saifei Gou, Yingdong Xia, Die Wang, Honglei Chen, W. Bao\",\"doi\":\"10.1109/CAS52836.2021.9604120\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Layered molybdenum disulfide (MoS2) is one of the representative two-dimensional (2D) semiconductors, offering a tantalizing prospect in the application of nanoelectronic devices and circuits. Here abnormal electrical and optoelectrical characteristics in transferred multilayer MoS2 transistors are observed and discussed. Such phenomena can be explained by the MoS2 intrinsic defects and the trapped charge impurities at the MoS2-dielectric and MoS2-MoS2 interfaces, as well as its charge screening effect. Our findings highlight the significance of controlling the dielectric interface and the material quality of 2D semiconductors, which are critical for the reliability of future 2D nanoelectronic devices.\",\"PeriodicalId\":281480,\"journal\":{\"name\":\"2021 International Semiconductor Conference (CAS)\",\"volume\":\"41 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2021-10-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2021 International Semiconductor Conference (CAS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CAS52836.2021.9604120\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 International Semiconductor Conference (CAS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CAS52836.2021.9604120","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

层状二硫化钼(MoS2)是具有代表性的二维(2D)半导体之一,在纳米电子器件和电路中具有诱人的应用前景。本文观察并讨论了转移多层二硫化钼晶体管的异常电学和光电特性。这种现象可以用MoS2的本征缺陷和MoS2-介电介质和MoS2-MoS2界面处的被捕获电荷杂质及其电荷屏蔽效应来解释。我们的研究结果强调了控制二维半导体的介电界面和材料质量的重要性,这对未来二维纳米电子器件的可靠性至关重要。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Abnormal device performance in transferred multilayer MoS2 field-effect transistors
Layered molybdenum disulfide (MoS2) is one of the representative two-dimensional (2D) semiconductors, offering a tantalizing prospect in the application of nanoelectronic devices and circuits. Here abnormal electrical and optoelectrical characteristics in transferred multilayer MoS2 transistors are observed and discussed. Such phenomena can be explained by the MoS2 intrinsic defects and the trapped charge impurities at the MoS2-dielectric and MoS2-MoS2 interfaces, as well as its charge screening effect. Our findings highlight the significance of controlling the dielectric interface and the material quality of 2D semiconductors, which are critical for the reliability of future 2D nanoelectronic devices.
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